Naoki Matsuzuka

Profile Information

Affiliation: Associate Professor, Department of Mechanical Engineering, Akashi National College of Technology

Degree: Ph.D.(Kyoto University)

J-GLOBAL ID: 200901090310404494
researchmap Member ID: 6000017478

Research Interests

Research Areas

Manufacturing technology (mechanical, electrical/electronic, chemical engineering) / Machine materials and mechanics /

Research History

Apr, 2015 - Present

Associate Professor, Department of Mechanical Engineering, National Institute of Technology, Akashi College
Apr, 2015 - Mar, 2018

School of Human Sciences, Kobe College
Apr, 2012 - Mar, 2015

Lecturer, Department of Mechanical Engineering, Akashi National College of Technology
Apr, 2008 - Mar, 2012

Assistant Professor, Department of Micro System Technology, Faculty of Science and Engineering, Ritsumeikan University
- Mar, 2008

Post-Doctoral Fellow, Research Organization of Science and Engineering, Ritsumeikan University

Committee Memberships

Apr, 2017 - Mar, 2019

技術情報誌「MECHAVOCATION」編集委員, 一般社団法人日本機械学会関西支部
Apr, 2017 - Mar, 2019

商議員, 一般社団法人日本機械学会関西支部
Apr, 2008 - Sep, 2008

実行委員, 日本機械学会 M&M2008材料力学カンファレンス

Papers

Fabrication and characterization of a CNT forest integrated micromechanical resonator for a rarefied gas analyzer in a medium vacuum atmosphere

Koji Sugano, Ryu Matsumoto, Ryota Tsutsui, Hiroyuki Kishihara, Naoki Matsuzuka, Ichiro Yamashita, Yukiharu Uraoka, Yoshitada Isono

Journal of Micromechanics and Microengineering, 26(7) 075010 1-9, Jul, 2016 Peer-reviewed
Semi-empirical calculation for design of flexural mode silicon Mechanical resonator with variable cross section

Naoki Matsuzuka, Takuya Hara, Yoshitada Isono

Sensors and Actuators A-Physical, 243 25-34, Jun, 2016 Peer-reviewedLead authorCorresponding author
Scanning probe lithography with negative and positive electron beam resists

Lydia Anggraini, Bungo Tanaka, Naoki Matsuzuka, Yoshitada Isono

Japanese Journal of Applied Physics, 52(5) 056501 1-8, May, 2013 Peer-reviewedCorresponding author
Derivation of upper and lower bounds for piezoresistive coefficients of polycrystalline silicon films with preferred orientation

Naoki Matsuzuka, Toshiyuki Toriyama

Zairyo/Journal of the Society of Materials Science, Japan, 61(3) 280-285, 2012 Peer-reviewedLead authorCorresponding author
Analysis of the piezoresistive properties of isotropic polysilicon based on a self-consistent micromechanics model

Naoki Matsuzuka, Toshiyuki Toriyama

Smart Materials and Structures, 20(8) 085018 1-8, Aug, 2011 Peer-reviewedLead authorCorresponding author
Analysis for piezoresistive property of heavily-doped polysilicon with upper and lower bounds

Naoki Matsuzuka, Toshiyuki Toriyama

Journal of Applied Physics, 108(6) 064902, Sep, 2010 Peer-reviewedLead authorCorresponding author
Nanolithography on the electron beam resist using the scanning probe microscope cantilever

Lydia Anggraini, Naoki Matsuzuka, Yoshitada Isono

ITB Journal of Science, 42(1) 1-10, 2010 Peer-reviewed
Scanning probe parallel nanolithography with multiprobe cantilever array fabricated by bulk silicon micromachining

Hensy Gandjar, Yuki Takagi, Naoki Matsuzuka, Yoshitada Isono

IEEJ Tramsactions on Electrical and Electronic Engineering, 3(3) 260-267, May, 2008 Peer-reviewed
Validation of X-ray lithography and development simulation system for moving mask deep X-ray lithography

Yoshikazu Hirai, Sadik Hafizovic, Naoki Matsuzuka, Jan G Korvink, Osamu Tabata

Journal of Microelectromechanical Systems, 15(1) 159-168, Feb, 2006 Peer-reviewed
A novel fabrication process of 3D microstructures by double exposure in deep x-ray lithography (D2XRL)

Naoki Matsuzuka, Yoshikazu Hirai, Osamu Tabata

Journal of Micromechanics and Microengineering, 15(11) 2056-2062, Nov, 2005 Peer-reviewedLead authorCorresponding author
Algorithm to Derive Optimal Mask and Movement Patterns in Moving Mask Deep X-ray Lithography (M2DXL)

Naoki Matsuzuka, Osamu Tabata

IEEJ Transactions on Sensors and Micromachines, 125(5) 222-228, 2005 Peer-reviewedLead authorCorresponding author
Deep x-ray exposure system with multistage for 3-D microfabrication

Hui You, Naoki Matsuzuka, Tadahiro Yamaji, Osamu Tabata

Journal of Micromechatronics, 2(1) 1-11, Jul, 2003 Peer-reviewed
Moving mask deep X-ray lithography system with multi stage for 3-D microfabrication

Osamu Tabata, Hui You, Naoki Matsuzuka, Tadahiro Yamaji, Suguru Uemura, Issei Dama,

Microsystem Technologies, 8(2-3) 93-98, May, 2002 Peer-reviewed

Misc.

たわみを有する両端固定梁の光応答周波数変化の計算

松塚直樹, 安木大恭, 近藤直輝, 上杉晃生, 菅野公二, 磯野吉正

第40回「センサ・マイクロマシンと応用システム」シンポジウム, 7A3-D-5 1-4, Nov, 2023
Fabrication and Characterization of CNT Forest Integrated Micromechanical Resonator for Rarefied Gas Sensor

Koji Sugano, Ryu Matsumoto, Ryota Tsutsui, Hiroyuki Kishihara, Naoki Matsuzuka, Yoshitada Isono

The 11th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, C2L-D-4, Apr, 2016
DEVELOPMENT OF MWCNT EMBEDDED MICROMECHANICAL RESONATOR WORKING AS RAREFIED GAS SENSOR

Hiroyuki Kishihara, Itsuo Hanasaki, Naoki Matsuzuka, Ichiro Yamashita, Yukiharu Uraoka, Yoshitada Isono

26th IEEE International Conference on Micro Electro Mechanical Systems (MEMS 2013), 985-988, 2013
マイクロメカニックスに基づく多結晶シリコン薄膜のピエゾ抵抗係数解析

清水佑一, 荒巻雄一, 松塚直樹, 鳥山寿之

関西学生会学生員卒業研究発表講演会, 6-18, Mar, 2012
CNT実装MEMS共振型ガスセンサの開発

岸原宏幸, 原拓也, 鄭彬, 浦岡行治, 山下一郎, 松塚直樹, 花崎逸雄, 磯野吉正

第28回「センサ・マイクロマシンと応用システム」シンポジウム, 561-564, Sep, 2011
OS06-2-3 Carbon nanotubes-embedded MEMS resonator device for hydrogen gas sensing system

Hara Takuya, Kishihara Hiroyuki, Hanasaki Itsuo, Zheng Bin, Yamashita Ichiro, Uraoka Yukiharu, Matsuzuka Naoki, Isono Yoshitada

Abstracts of ATEM : International Conference on Advanced Technology in Experimental Mechanics : Asian Conference on Experimental Mechanics, 2011(10) 144-2-3-1", Sep, 2011
多結晶シリコンのピエゾ抵抗効果における上下界評価方法

北川弥央, 松塚直樹, 鳥山寿之

第27回「センサ・マイクロマシンと応用システム」シンポジウム, 223-227, Oct, 2010
多結晶シリコンのピエゾ抵抗効果評価方法

松塚直樹, 鳥山寿之

日本機械学会2010年度年次大会（講演論文集Vol.1）, 241-242, Sep, 2010
T0302-2-2 Design of Fixed-Fixed Beam MEMS Resonator with Non-uniform Rectangular Cross Section

ISONO Yoshitada, MATSUZUKA Naoki, HARA Takuya

The proceedings of the JSME annual meeting, 2009 67-68, Sep, 2009
Combustion test of a micro can type combustor for MEMS gas turbine engines

Akira Furutani, Yu Suzuki, Shouhei Ozaki, Cholho Kim, Naoki Takano, Naoki Matsuzuka, Toshiyuki Toriyama

The 8 th International Workshop on Micro and Nanotechnology for Power Generation and Energy Conversion Application, 113-116, Nov, 2008
Process condition of scanning probe nanolithography using positive EB resist

Lydia Anggraini, Naoki Matsuzuka, Yoshitada Isono

第25回「センサ・マイクロマシンと応用システム」シンポジウム, 21-24, Oct, 2008
超小型ターボ機械用ロータの構造と空力設計に関する考察

古川浩隆, 森拓也, 三輪純一, 坂口圭, 松塚直樹, 鳥山寿之

M&M 2008 材料力学カンファレンス, CD-ROM, Sep, 2008
MHz帯域RF-MEMS共振器の設計開発

松塚直樹, 磯野吉正

日本機械学会2008年度年次大会（講演論文集Vol.8）, 153-154, Aug, 2008
Development of scanning probe parallel nanowriting system with electron beam resist

Naoki Matsuzuka, Bungo Tanaka, Toshihiko Nagarmira, Tobru Sasaki, Takahiro Namaza, Yoshitada Isono

The 14th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS '07 & EUROSENSORS XXI), 1649-1652, Jun, 2007
Establishment of probe nano writing technique using EB resist and application to nano device

Masahiro Onoda, Bungo Tanaka, Naoki Matsuzuka, Yoshitada Isono

第23回「センサ・マイクロマシンと応用システム」シンポジウム, 429-432, Oct, 2006
Effective 3-D process modeling and parameters determination on double exposure in deep x-ray lithography

Yoshikazu Hirai, Naoki Matsuzuka, Osamu Tabata

Memoirs of The SR Center Ritsumeikan University, 8 45-54, Apr, 2006
Prediction method of 3-D shape fabricated by double exposure technique in deep X-ray lithography (D2XRL)

Naoki Matsuzuka, Yoshikazu Hirai, Osamu Tabata

19th IEEE International Conference on Micro Electro Mechanical Systems (MEMS2006), 186-189, Jan, 2006
Study on 3-D microfabrication by double exposure method in deep x-ray lithography

Naoki Matsuzuka, Yoshikazu Hirai, Osamu Tabata

第22回「センサ・マイクロマシンと応用システム」シンポジウム, 297-301, Oct, 2005
Analytical method for process parameters determination on double exposure deep x-ray lithography

Yoshikazu Hirai, Naoki Matsuzuka, Osamu Tabata

High Aspect Ratio Micro-Structure Technology Workshop, 144-145, Jun, 2005
A new experimental technique for process parameter determination on x-ray lithography

Naoki Matsuzuka, Yoshikazu Hirai, Osamu Tabata

High Aspect Ratio Micro-Structure Technology Workshop, 146-147, Jun, 2005

Books and Other Publications

専門基礎ライブラリー「実例で学ぶ機械設計製図」

高等専門学校教育連携プロジェクト (Role: Joint author)

実教出版, Jun, 2019
専門基礎ライブラリー「機械設計」

高等専門学校教育連携プロジェクト (Role: Joint author)

実教出版, Nov, 2017
Advanced Miro & Nanosystems Vol. 7 LIGA and its Applications

Naoki Matsuzuka, Osamu Tabata (Role: Joint author, Innovative exposure techniques for 3D microfabrication (Chapter 3))

WILEY-VCH Verlag Gmbh & Co. KGaA, 2009

Presentations

たわみを有する両端固定梁の光応答周波数変化の計算

松塚直樹

第40回「センサとマイクロマシン応用システム」シンポジウム, Nov, 2023
マイクロマシン技術

松塚直樹

平成29年度明石高専技術講演会, Sep, 2017
マイクロマシン技術の基礎

松塚直樹

第81回明石高専イヴニングセミナー, May, 2014
マイクロメカニックス理論に基づくMEMS用薄膜材料の機械・電気物性解析法

松塚直樹

第48回マイクロマテリアル部門委員会（日本材料学会）, Feb, 2014
多結晶シリコン材料のピエゾ抵抗効果評価法

松塚直樹

日本機械学会2010年度年次大会, Sep, 2010
MHz帯域RF-MEMS共振器の設計開発

松塚直樹

日本機械学会2008年度年次大会, Aug, 2008
Development of scanning probe parallel nanowriting system with electron beam resist

Naoki Matsuzuka

The 14th International Conference on Solid-State Sensors, Actuators and Microsystems, Jun, 2007
Prediction method of 3-D shape fabricated by double exposure technique in deep x-ray lithography

Naoki Matsuzuka

The 19th International Conference on Micro Electro Mechanical Systems, Jan, 2006
Study on 3-D microfabrication by double exposure method in deep x-ray lithography (D2XRL)

松塚直樹

第22回「センサ・マイクロマシンと応用システム」シンポジウム, Oct, 2005
A new experimental technique for process parameters determination on x-ray lithography

Jun, 2005
3-D micro-machining technique by double exposure in normal deep x-ray lithography

松塚直樹

第21回「センサ・マイクロマシンと応用システム」シンポジウム, Oct, 2004
A novel fabrication process of 3-D microstructures by double exposure in standard deep x-ray lithography

Naoki Matsuzuka

The 17th International Conference on Micro Electro Mechanical Systems, Jan, 2004
Effect of development process in moving mask deep x-ray lithography for 3D microfabrication

Jun, 2003
Algorithm for analyzing optimal mask movement pattern in moving mask deep x-ray lithography

Naoki Matsuzuka

2002 Internation Symposium on Micromechatronics and Human Science, Oct, 2002
Determination of optimal mask movement pattern for moving mask deep x-ray lithography

松塚直樹

第19回「センサ・マイクロマシンと応用システム」シンポジウム, May, 2002
Moving mask deep x-ray exposure system with multi stage for 3-D microfabrication

松塚直樹

第18回「センサ・マイクロマシンと応用システム」シンポジウム, May, 2001

Teaching Experience

Professional Memberships

Industrial Property Rights

特許3521205 微細構造体の製造方法とこれによって製造された微細構造体

田畑修, 松塚直樹

Profile Information

Research Interests

Research Areas

Research History

Committee Memberships

Papers

Misc.

Books and Other Publications

Presentations

Teaching Experience

Professional Memberships

Industrial Property Rights

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