論文

査読有り
2000年

Short cycle killer-particle control based on accurate in-line defect classification

ISSM 2000: NINTH INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, PROCEEDINGS
  • A Shimoda
  • ,
  • K Watanabe
  • ,
  • Y Takagi
  • ,
  • S Maeda

開始ページ
199
終了ページ
202
記述言語
英語
掲載種別
研究論文(国際会議プロシーディングス)
出版者・発行元
IEEE

We present a systematic yield ramp-up method that can quickly screen "killer" particles associated with yield loss and pinpoint their entry point to the process. The proposed method uses automatic defect classification (ADC) to segregate killer particles. The practicality of this method is demonstrated by the results of experiments using actual production wafers. This method will make killer particle control more timely.

Web of Science ® 被引用回数 : 2

リンク情報
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000175610700045&DestApp=WOS_CPL