Papers

Peer-reviewed
2000

Short cycle killer-particle control based on accurate in-line defect classification

ISSM 2000: NINTH INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, PROCEEDINGS
  • A Shimoda
  • ,
  • K Watanabe
  • ,
  • Y Takagi
  • ,
  • S Maeda

First page
199
Last page
202
Language
English
Publishing type
Research paper (international conference proceedings)
Publisher
IEEE

We present a systematic yield ramp-up method that can quickly screen "killer" particles associated with yield loss and pinpoint their entry point to the process. The proposed method uses automatic defect classification (ADC) to segregate killer particles. The practicality of this method is demonstrated by the results of experiments using actual production wafers. This method will make killer particle control more timely.

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Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000175610700045&DestApp=WOS_CPL
ID information
  • Web of Science ID : WOS:000175610700045

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