論文

査読有り
2020年7月22日

Structural and electrical characterization of hydrothermally deposited piezoelectric (K,Na)(Nb,Ta)O3 thick films

Journal of Materials Science
  • Takahisa Shiraishi
  • ,
  • Yuta Muto
  • ,
  • Yoshiharu Ito
  • ,
  • Takanori Kiguchi
  • ,
  • Kazuhisa Sato
  • ,
  • Masahiko Nishijima
  • ,
  • Hidehiro Yasuda
  • ,
  • Hiroshi Funakubo
  • ,
  • Toyohiko J. Konno

55
21
開始ページ
8829
終了ページ
8842
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1007/s10853-020-04663-x
出版者・発行元
Springer Science and Business Media {LLC}

(K0.89Na0.11)(Nb0.85Ta0.15)O-3 thick films were epitaxially grown at 200 degrees C on (001)La:SrTiO3 and (001)(c)SrRuO3//(001)SrTiO3 substrates by hydrothermal method, and their crystal structures and electrical properties were investigated. Film thickness increased with deposition time and reached 6 mu m in 10 h. High-temperature X-ray diffraction measurement showed that successive phase transitions from orthorhombic to tetragonal and from tetragonal to cubic phases take place at 120 and 400 degrees C, respectively. Microstructure analyses were performed by using electron microscopy, which revealed the existence of two types of stripe patterns with a width of 100 nm or less. In addition, scanning transmission electron microscopy-energy-dispersive X-ray spectroscopy elemental mapping showed that Nb/(Nb + Ta) ratio of the deposited films abruptly changed around 700 nm in thickness. Annealing at 500 degrees C led to the reduction in leakage current density from 10(2) to 10(-5) A/cm(2) at 30 kV/cm, showing that annealing is an effective way to improve insulation. Relative dielectric constant (epsilon(r)) decreased linearly with increasing frequency, reaching 450 at 10 kHz. Polarization-electric field hysteresis loop and field-induced stain curve were measured by piezoelectric force microscopy, which showed remanent polarization (P-r) of 30 mu C/cm(2) and piezoelectric constant (d(33,PFM)) of 70 pm/V. These results demonstrate that (K,Na)(Nb,Ta)O-3 thick films with superior electrical properties can be fabricated by the low-temperature deposition technique.

リンク情報
DOI
https://doi.org/10.1007/s10853-020-04663-x
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000528149000008&DestApp=WOS_CPL
ID情報
  • DOI : 10.1007/s10853-020-04663-x
  • ISSN : 0022-2461
  • eISSN : 1573-4803
  • ORCIDのPut Code : 72598535
  • Web of Science ID : WOS:000528149000008

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