論文

査読有り
2008年8月

Low-loss Silicon Oxynitride Waveguides and Branches for the 850-nm-Wavelength Region

JAPANESE JOURNAL OF APPLIED PHYSICS
  • Tai Tsuchizawa
  • Toshifumi Watanabe
  • Koji Yamada
  • Hiroshi Fukuda
  • Seiichi Itabashi
  • Junichi Fujikata
  • Akiko Gomyo
  • Jun Ushida
  • Daisuke Okamoto
  • Kenichi Nishi
  • Keishi Ohashi
  • 全て表示

47
8
開始ページ
6739
終了ページ
6743
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1143/JJAP.47.6739
出版者・発行元
JAPAN SOCIETY APPLIED PHYSICS

We developed silicon oxynitride (SiON) waveguides and branches working at around 850 nm wavelength for on-chip optical interconnection. SiON films were deposited by plasma-enhanced chemical vapor deposition (PECVD) and were very transmissive in this wavelength region. The propagation losses of fabricated waveguides were as low as 0.2-0.3 dB/cm. The branches are based on multimode interference (MMI) and exhibited excellent 3 dB characteristics. We also integrated a SiON waveguide with a Si nano-photodiode (PD) with a surface plasmon antenna. A large photocurrent of about 0.1 mA at a coupling length of only 10 mu m and a high-speed response of 17 ps were demonstrated for the waveguide-integrated Si nano-PD.

リンク情報
DOI
https://doi.org/10.1143/JJAP.47.6739
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000260003100025&DestApp=WOS_CPL
共同研究・競争的資金等の研究課題
新探求配線技術開発(LSI チップ光配線技術開発)
URL
https://iopscience.iop.org/article/10.1143/JJAP.47.6739/meta
ID情報
  • DOI : 10.1143/JJAP.47.6739
  • ISSN : 0021-4922
  • ORCIDのPut Code : 104531875
  • Web of Science ID : WOS:000260003100025

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