論文

2002年8月

Crack initiation at free edge of interface between thin films in advanced LSI

ENGINEERING FRACTURE MECHANICS
  • T Kitamura
  • ,
  • T Shibutani
  • ,
  • T Ueno

69
12
開始ページ
1289
終了ページ
1299
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/S0013-7944(02)00009-7
出版者・発行元
PERGAMON-ELSEVIER SCIENCE LTD

Since electronic devices are made of multi-layered sub-micron films, delamination along the interface is one of the major failure mechanisms. This paper aims to develop a method for evaluating the mechanical criterion of interface cracking between thin films on a substrate. The focus is put on crack initiation from the free edge of the interface where the stress concentrates due to the mismatch of elastic deformation. In the evaluation, it is important to exclude plastic deformation and fracture of the thin metal film, because they bring about ambiguity on the measured magnitude of interface strength. In this study, an experimental method is proposed on the basis of fracture mechanics concepts, and the validity is examined by tests on Cu (conductor metal)/TaN (barrier metal) interface in a large-scale integrated circuit. The critical stress intensity at delamination crack initiation is successfully analyzed by the boundary element method. (C) 2002 Elsevier Science Ltd. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/S0013-7944(02)00009-7
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000177072300001&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/S0013-7944(02)00009-7
  • ISSN : 0013-7944
  • Web of Science ID : WOS:000177072300001

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