2011年8月
Fabrication of TiAl3 coating on TiAl-based alloy by Al electrodeposition from dimethylsulfone bath and subsequent annealing
SURFACE & COATINGS TECHNOLOGY
- ,
- ,
- 巻
- 205
- 号
- 21-22
- 開始ページ
- 5141
- 終了ページ
- 5146
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1016/j.surfcoat.2011.05.019
- 出版者・発行元
- ELSEVIER SCIENCE SA
TiAl3 coating was formed on TiAl alloy by Al electrodeposition from a dimethylsulfone (DMSO2) bath and subsequent annealing. Before the Al electrodeposition, anodic dissolution of TiAl substrate in the DMSO2 bath was conducted to remove the surface oxide layer of the TiAl substrate. By performing the Al electrodeposition immediately after the anodic dissolution, uniform Al films adherent to the TiAl substrate could be obtained. Annealing at 650-1000 degrees C yielded a single TiAl3 layer or two layers of TiAl3 and TiAl2 on the TiAl substrate. The resulted TiAl3 layer was confirmed to show oxidation-resistance at high temperatures. (C) 2011 Elsevier B.V. All rights reserved.
- リンク情報
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- DOI
- https://doi.org/10.1016/j.surfcoat.2011.05.019
- J-GLOBAL
- https://jglobal.jst.go.jp/detail?JGLOBAL_ID=201102278842843519
- CiNii Articles
- http://ci.nii.ac.jp/naid/80021953389
- Web of Science
- https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000293119800040&DestApp=WOS_CPL
- ID情報
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- DOI : 10.1016/j.surfcoat.2011.05.019
- ISSN : 0257-8972
- J-Global ID : 201102278842843519
- CiNii Articles ID : 80021953389
- Web of Science ID : WOS:000293119800040