論文

査読有り
2018年4月1日

Growth Process and Photoluminescence Properties of In-Plane Ultrahigh-Density InAs Quantum Dots on InAsSb/GaAs(001)

Physica Status Solidi (B) Basic Research
  • Shingo Oikawa
  • ,
  • Akinori Makaino
  • ,
  • Tomah Sogabe
  • ,
  • Koichi Yamaguchi

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記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1002/pssb.201700307
出版者・発行元
Wiley-VCH Verlag

InAs is grown on InAsSb/GaAs(001) by molecular beam epitaxy (MBE). At the initial growth of InAs, elongated small two-dimensional (2D) islands are formed on the InAsSb wetting layer (WL). As the InAs growth proceeded, 3D dots are spontaneously formed, and the underlying 2D terrace narrows. In addition, surface atoms of the 2D layer desorbed because of the strain relaxation. The 3D dot volume is larger than that estimated from the supply amount. From these results, it is found that surface atoms desorbed from the 2D layer are re-incorporated into 3D islands. The dot density reaches at 1 × 1012cm−2. The photoluminescence (PL) peak energy and full width at half maximum discontinuously changed at the critical coverage for 2D–3D growth mode transition. Particularly, the PL peak energy is almost proportional to the −0.27-th power of the average volume of 3D islands. It reveals that the carriers in these 3D islands have properties based on the 0D electron system, despite of in-plane ultrahigh density and small sizes. In addition, the relationship between PL intensity and quantum-dot density is evaluated.

リンク情報
DOI
https://doi.org/10.1002/pssb.201700307

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