Haruhiko Ito - My portal

Profile Information

J-GLOBAL ID: 201801002666548192
researchmap Member ID: 7000022289

Research History

Apr, 2007 - Present

Nagaoka University of Technology
Apr, 1994 - Mar, 2007

Nagaoka University of Technology
Jan, 1989 - Mar, 1994

Nagaoka University of Technology
Apr, 1988 - Dec, 1988

Special researcher of the Japan Society for the Promotion of Science, Institute for Molecular Science

Papers

Quantitative NEXAFS and solid-state NMR studies of sp(3)/(sp(2) + sp(3)) ratio in the hydrogenated DLC films

XiaoLong Zhou, Sarayut Tunmee, Tsuneo Suzuki, Pat Phothongkam, Kazuhiro Kanda, Keiji Komatsu, Seiichi Kawahara, Haruhiko Ito, Hidetoshi Saitoh

DIAMOND AND RELATED MATERIALS, 73(1) 232-240, Mar, 2017 Peer-reviewed
Investigation of pitting corrosion of diamond-like carbon films using synchrotron-based spectromicroscopy

Sarayut Tunmee, Pat Photongkam, Chanan Euaruksakul, Hiroki Takamatsu, XiaoLong Zhou, Pornwasa Wongpanya, Keiji Komatsu, Kazuhiro Kanda, Haruhiko Ito, Hidetoshi Saitoh

JOURNAL OF APPLIED PHYSICS, 120(19) 1-10, Nov, 2016 Peer-reviewed
Changes of chemical structure of hydrogenated amorphous silicon carbide films with the application of radio-frequency bias voltages during chemical vapor deposition

Haruhiko Ito, Takeshi Ogaki, Motoki Kumakura, Shunsuke Saeki, Tsuneo Suzuki, Hiroki Akasaka, Hidetoshi Saitoh

DIAMOND AND RELATED MATERIALS, 66(1) 1-9, Jun, 2016 Peer-reviewed
Fabrication of Hydrogenated Amorphous Silicon Carbide Films from Decomposition of Hexamethyldisilane with Microwave Discharge Flow of Ar

H. Ito, M. Kumakura, T. Suzuki, M. Niibe, K. Kanda, H. Saitoh

japanese Journal of Applied Physics, 55(06HC01) 1-9, May 20, 2016 Peer-reviewed
Contribution of CN(X-2 Sigma(+)) radicals to N atoms of hydrogenated amorphous carbon nitride films formed from the microwave discharge of the gas mixture of N-2 and CH3CN

Haruhiko Ito, Nobuyoshi Mogi, Kohtaro Okada, Hiroki Tsudome

DIAMOND AND RELATED MATERIALS, 63(3月) 125-131, Mar, 2016 Peer-reviewed
Influence of voltage on etching rate of hydrogenated amorphous carbon films with HNO3 studied using surface plasmon resonance

Sarayut Tunmee, Yasuyuki Nakaya, XiaoLong Zhou, Satoru Arakawa, Keiji Komatsu, Haruhiko Ito, Hidetoshi Saitoh

JAPANESE JOURNAL OF APPLIED PHYSICS, 55(2) 1-4, Feb, 2016 Peer-reviewed
Precursor of N atoms of hydrogenated amorphous carbon nitride films formed from the microwave discharge of C2H2/N-2 gas mixture

Haruhiko Ito, Hiroki Tsudome, Nobuyoshi Mogi, Hidetoshi Saitoh

JAPANESE JOURNAL OF APPLIED PHYSICS, 55(1) 1-9, Jan, 2016 Peer-reviewed
Production of CH(A2) radicals from the dissociative excitation reaction of C2H2 with microwave discharge flow of Ar

Haruhiko Ito, Hiroki Tsudome

Japanese Journal of Applied Physics, 54(06GA04) 1-8, Jun 1, 2015 Peer-reviewed
Laser-Spectroscopic measuremeents of the Free Radicals Produced from the Disssociation of C2H2 with the Miccrowave Discharge Flow of Ar

Haruhiko Ito, Hiroki Tsudome

Transactions of Material Research Society of Japan, 40(1) 33-36, Mar 20, 2015 Peer-reviewed
Study of Synchrotron Radiation Near-Edge X-Ray Absorption Fine-Structure of Amorphous Hydrogenated Carbon Films at Various Thicknesses

Sarayut Tunmee, Ratchadaporn Supruangnet, Hideki Nakajima, XiaoLong Zhou, Satoru Arakawa, Tsuneo Suzuki, Kazuhiro Kanda, Haruhiko Ito, Keiji Komatsu, Hidetoshi Saitoh

JOURNAL OF NANOMATERIALS, 2015(276790) 1-7, 2015 Peer-reviewed
Mechanism of Production of CN((XI)-I-2 (+)) pound Radicals from the Decomposition Reaction of CH3CN with Microwave Discharge Flow of Ar

Haruhiko Ito, Katsuaki Koshimura, Ayumi Yamamoto, Hiroki Tsudome, Nurul Izzaty Binti Zamri, Hitoshi Araki, Akira Wada

PLASMA CHEMISTRY AND PLASMA PROCESSING, 34(4) 837-851, Jul, 2014 Peer-reviewed
Analysis of the production of the CH(A(2)Delta) state from the dissociative excitation of tetramethylsilane in the electron-cyclotron resonance plasma of Ar: The H2O-addition method

Haruhiko Ito, Rie Gappa

JAPANESE JOURNAL OF APPLIED PHYSICS, 53(3) 1-7, Mar, 2014 Peer-reviewed
Fabrication of a-CNx films by RF-plasma decomposition of BrCN

H. Ito, K. Okada, T. Tsuda, H. Akasaka, H. Saitoh

Transactions of Material Society ofJapan, 38(4) 677-680, Dec 31, 2013 Peer-reviewed
Comprehensive Classification of Near-Edge X-ray Absorption Fine Structure Spectra of Si-Containing Diamond-Like Carbon Thin Films

Kazuhiro Kanda, Masahito Niibe, Akira Wada, Haruhiko Ito, Tsuneo Suzuki, Tsuguyori Ohana, Naoto Ohtake, Hidetoshi Saitoh

JAPANESE JOURNAL OF APPLIED PHYSICS, 52(9) 1-4, Sep, 2013 Peer-reviewed
(Me3N)Mo(CO)(5)-Catalyzed Reduction of DMF by Disiloxane and Disilane Moieties: Fate of the Silicon-Containing Fragments

Hemant K. Sharma, Renzo Arias-Ugarte, David Tomlinson, Rie Gappa, Alejandro J. Metta-Magana, Haruhiko Ito, Keith H. Pannell

ORGANOMETALLICS, 32(14) 3788-3794, Jul, 2013 Peer-reviewed
Analysis of Dissociative Excitation Reaction of Tetramethylsilane with Microwave Discharge Flow of Ar

Haruhiko Ito, Rie Gappa

Transactions of Materials Research Society of Japan1nihonn, 38(2) 239-242, Jun 30, 2013 Peer-reviewed
Fabrication of Amorphous Silicon Carbide Films from Decomposition of

H. Ito, S. Onitsuka, R. Gappa, H. Saitoh, R. Roacho, K. H. Pannell, T. Suzuki, M. Niibe, an

Journal of Physics Confference Series, 441(012039) 1-4, Jun 13, 2013 Peer-reviewed
Source of nitrogen atoms of amorphous carbon nitride films fabricated with microwave-plasma CVD processes

H. Ito, A. Yamamoto, T. Suzuki, H. Saitoh

Transacctions of Material Research Society of Japan, 38(1) 31-34, Mar 31, 2013 Peer-reviewed
Dissociative Excitation of C2H2 in the Electron Cyclotron Resonance Plasma of Ar: Production of CH(A(2)Delta) Radicals and Formation of Hydrogenated Amorphous Carbon Films

Haruhiko Ito, Katsuaki Koshimura, Saori Onitsuka, Kohtaro Okada, Tsuneo Suzuki, Hiroki Akasaka, Hidetoshi Saitoh

PLASMA CHEMISTRY AND PLASMA PROCESSING, 32(2) 231-248, Apr, 2012 Peer-reviewed
Precursors of a-CNx(:H) films from the decompositions of BrCN and CH3CN with the discharged products of Ar

Haruhiko Ito, Ayumi Yamamoto, Hitoshi Araki, Akira Wada

DIAMOND AND RELATED MATERIALS, 24(1) 121-125, Apr, 2012 Peer-reviewed

Misc.

アモルファス炭素系材料合成のためのプラズマ分子分光計測

伊藤治彦

New Diamond, 92(1) 44-50, Jan, 2009
アモルファス炭素系材料合成のためのプラズマ分子分光計測

伊藤治彦

New Diamond, 91(1) 48-54, Oct, 2008
アモルファス炭素系材料合成のためのプラズマ分子分光計測

伊藤治彦

New Diamond, 90(1) 45-51, Jul, 2008
アモルファス炭素系材料合成のためのプラズマ分子分光計測

伊藤治彦

New Diamond, 89(1) 45-49, Apr, 2008
Optimization of the Electric-Field Emission Type Microplasma Device Based on the Spectroscopic Measurement of Hydrogen-Containing Free Radicals

Scientific Research on Priority Area, "Generation of Micro-Scale Reactive Plasmas and Development of Their New Applications", Summary Report, 39-42, Mar, 2008
アモルファス炭素系材料合成のためのプラズマ分子分光計測

NEW DIAMOND, 24(1) 36-38, Jan, 2008
Mechanism of Dissociative Excitation of BrCN in Electron Cyclotron Resonance

18th International Symposium on Plasma Chemistry, Full-paper CD,30Ｐ-17, 1-4, Aug, 2007

Presentations

Synthesis and Structural Analysis of Hydrogenated Amorphous Carbon Nitrides with High [N]/([N]+[C]) Ratios

Haruhiko Ito, Kennya Hiramatsu, Hidetoshi Saitoh

IUMRS-ICAM2017, Aug 31, 2017, MRS-J
CN(X2-sigma+) Radicals as the Precursor of Hydrogenated Amorphous Carbon Nitride Films

H. Ito

IPS2016, Jun 29, 2016, International Science Committie of IPS
Si(CH3)4の放電分解によるa-SiCx:H薄膜の形成 ― 表面O原子と膜厚に関する考察

伊藤治彦

2017年第64回応用物理学会春季学術講演会, Mar 16, 2016, 応用物理学会
Fabrication of Hydrogenated Amorphous Silicon Carbide Films from Decomposition of Hexamethyldisilane with Microwave Discharge Flow of Ar

H. Ito, M. Kumakura, T. Suzuki, M. Niibe, K. Kanda, H. Saitoh

Dry Process Symposium 2015, Nov 6, 2015, 応用物理学会
Precursor of N atoms of Hydrogeneated Amorphous Carbon Nitride Films Formed from the Microwave Discharge of C2H2/N2 Gas Mixture

Haruhiko Ito, Hiroki Tsudome, Nobuyoshi Mogi

ISPlamsa 2015, Mar 30, 2015, 応用物理学会
Production of CH(A2) Radicals from the Dissociative Excitation Reaction of C2H2 with Microwave Discharge Flow of Ar

H. Ito, H. Tsudome

Dry Process Symposium 2014, Nov 28, 2014, 応用物理学会
Laser-Induced Fluorescence Measurements on the Microwave-Plasma Flow Producing Amorphous Carbon Nitrides with High [N]/([N]+[C]) Ratios

IUMRS-ICA2014, Aug 28, 2014, Materials Society of Japan
Laser-Spectroscopic Measurements of the Free Radicals Produced from the Dissociation of C2H2 with the Microwave Discharge Flow of Ar

IUMRS-ICA2014, Aug 28, 2014, Materials Society of Japan
「光と薄膜」―プラズマの分光計測にもとづく炭素系薄膜の材料設計

伊藤治彦

第61回応用物理学会春季学術講演会, Mar 17, 2014, 応用物理学会 Invited
高い窒素含有率を有するアモルファス窒化炭素薄膜の一般的合成法の確立

伊藤治彦

第27回ダイヤモンドシンポジウム, Nov 21, 2013, ニューダイヤモンドフォーラム
Mechanism of the Production of the CH(A2) State from the Dissociative Excitation of Tetramethylsilane in the Electron-Cyclotron Resonance Plasma of Ar

H. Ito, R. Gappa

DPS2013, Aug 30, 2013, The Japan Society of Applied Physics
Mechanism of Film hardening of Hydrogenated Amorphous Silicon Carbide Films Fabricated by the Decomposition of Tetramethylsilane with the Microwave Discharge Flow of Ar

Haruhiko Ito, Takeshi Ohgaki, Hiroki Akasaka, Hidetoshi Saitoh

ISSP2013, Jul 10, 2013, The Vacuum Society of Japan
アモルファス炭化ケイ素薄膜の硬質化メカニズム

伊藤治彦, 大柿猛, 赤坂大樹, 斎藤秀俊

第６０回応用物理学会春季学術講演会, Mar 28, 2013, 応用物理学会
アモルファス窒化炭素薄膜の窒素源について

伊藤治彦, 山元愛弓, NURUL IZZATY, BINTI ZAMRI, 鈴木常生

第６０回応用物理学会春季学術講演会, Mar 28, 2013, 応用物理学会
Fabrication of Amorphous Silicon Carbide Films from Decomposition of Tetramethylsilane using ECR Plasma of Ar

H. Ito, S. Onitsuka, R. Gappa, H. Saitoh, R. Roacho, K. H. Pannell, T. Suzuki, M. Niibe, K. Kanda

APCPST & SPSM 2012, Oct 3, 2012, 日本学術振興会第１５３小委員会、他
Source of nitrogen atoms of amorphous carbon nitride films fabricated with microwave-plasma CVD processes

H. Ito, A. Yamamoto, T. Suzuki, H. Saitoh

IUMRS-ICEM2012, Sep 28, 2012, Material Research Society of Japan
Arの電子サイクロトロン共鳴プラズマにおけるC2H2の解離励起

第59回応用物理学関係連合講演会, Mar 17, 2012, 応用物理学会
アモルファスカーボンナイトライド形成におけるCNラジカルの寄与について

第25回ダイヤモンドシンポジウム, Dec 9, 2011, ニューダイヤモンドフォーラム
Stickin Probability of CN Radicals

NDNC2010, May 17, 2010, NDNC2010 Organizing Committee
CNラジカルの付着確率２

第57回応用物理学関係連合討論会, Mar 19, 2010, 応用物理学会

Professional Memberships

ニューダイヤモンドフォーラム

Research Projects

高硬度アモルファス窒化炭素薄膜の形成と薄膜堆積メカニズムの解明

科学研究費, Apr, 2016 - Mar, 2018

伊藤治彦
水素含有ラジカルの分光計測にもとづく電界放出型マイクロプラズマ素子の最適化

科学研究費・特定領域研究「マイクロプラズマ」
エネルギー制御されたイオン衝撃によるアモルファス窒化炭素の超硬質化ダイナミクス

科学研究費
アモルファス窒化炭素材料の波長可変深紫外in situ共鳴ラマン分光計測

学長裁量経費
高窒素含有・超硬質アモルファスカーボンナイトライドの創製

JSTシーズ発掘試験
高分解能差周波レーザー分光法にもとづくアモルファス炭素系薄膜の超硬質化機構の解明

科学研究費
エネルギー制御されたイオン衝撃によるアモルファス窒化炭素の超硬質化ダイナミクス

科学研究費

Industrial Property Rights

特願2008-217770 プラズマCVD法を用いた硬質アモルファスSiC薄膜の形成