Hideo Aida - My portal

Profile Information

Affiliation: Associate Professor, Nagaoka University of Technology

J-GLOBAL ID: 201801005891758081
researchmap Member ID: 7000022298

Research History

Jun, 2017 - Present

Nagaoka University of Technology
Nov, 2016 - Mar, 2018

Visiting Professor, Global Innovation Center, Kyushu University
Apr, 2015 - Mar, 2016

Specially Appointed Professor, KASTEC, Kyushu University
Apr, 2013 - Mar, 2015

Specially Appointed Associate Professor, KASTEC, Kyushu University

Awards

Sep, 2017

応用物理学会優秀論文賞, 応用物理学会
Jul, 2017

Excellent Paper Award, MIRAI conference on Microfabrication and Green Technology
Apr, 2016

日本機械学会論文賞, 日本機械学会
Mar, 2016

精密工学会高城賞, 精密工学会

Papers

Patterned sapphire substrates for III-nitride epitaxial growth

Natsuko Omiya, Hideo Aida, Yutaka Kimura, Yuki Kawamata, Seong-Woo Kim, Michio Uneda

International Journal of Automation Technology, 12(2) 179-186, 2018 Peer-reviewed
Effect of back-surface roughness of sapphire substrate on growth of GaN thin films

Hideo Aida, Seong-woo Kim, Toshimasa Suzuki

PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 50(-) 142-147, Oct, 2017 Peer-reviewed
Plasma fusion chemical mechanical polishing as a next generation processing technology and its applications to SiC, GaN, and diamond substrates

Hideo Aida, Toshiro Doi, Yasuhisa Sano, Syuhei Kurokawa

Advanced Micro-Fabrication and Green Technology, 5(-) 70-75, Jun 28, 2017 Peer-reviewed
Microneedle growth method as an innovative approach for growing freestanding single crystal diamond substrate: Detailed study on the growth scheme of continuous diamond layers on diamond microneedles

Hideo Aida, Seong-Woo Kim, Kenjiro Ikejiri, Daiki Fujii, Yuki Kawamata, Koji Koyama, Hideyuki Kodama, Atsuhito Sawabe

DIAMOND AND RELATED MATERIALS, 75(-) 34-38, May, 2017 Peer-reviewed
GaN基板のプラズマ融合CMPプロセス～エタノールバブリング・Arプラズマを用いたプラズマ融合CMP特性とその評価～

山崎直樹, 土肥俊郎, 會田英雄, 金聖祐, 大山幸希, 黒河周平, 佐野泰久, 白谷正治, 山西陽子

信学技報 (IEEE Technical Report), 117(8) 19-23, Apr 13, 2017 Peer-reviewed
The Polishing effect of SiC Substrates in Femtosecond Laser Irradiation Assisted Chemical Mechanical Polishing (CMP)

Chengwu Wang, Syuhei Kurokawa, Toshiro Doi, Julong Yuan, Yasuhisa Sano, Hideo Aida, Kehua Zhang, Qianfa Deng

ECS Journal of Solid State Science and Technology, 6(4) P105-P112, Jan 26, 2017 Peer-reviewed
Chemical Mechanical Polishing Mechanism of Hard-to-Process Materials Using Suede Type Polishing Pad

UNEDA Michio, TAKANO Keiichi, SAKAMOTO Masataka, KOYAMA Koji, AIDA Hideo, ISHIKAWA Ken-ichi

Journal of the Japan Society for Precision Engineering, 82(7) 703-708, Jul 6, 2016 Peer-reviewed
Overgrowth of diamond layers on diamond microneedles: New concept for freestanding diamond substrate by heteroepitaxy

Hideo Aida, Kenjiro Ikejiri, Seong-Woo Kim, Koji Koyama, Yuki Kawamata, Hideyuki Kodama, Atsuhito Sawabe

DIAMOND AND RELATED MATERIALS, 66(-) 77-82, Jun, 2016 Peer-reviewed
Fabrication of freestanding heteroepitaxial diamond substrate via micropatterns and microneedles

Hideo Aida, Seong-Woo Kim, Kenjiro Ikejiri, Yuki Kawamata, Koji Koyama, Hideyuki Kodama, Atsuhito Sawabe

APPLIED PHYSICS EXPRESS, 9(3) 035504-1-035504-4, Mar, 2016 Peer-reviewed
Analysis of sapphire- chemical mechanical polishing using digital image processing

Michio Uneda, Koji Koyama, Hideo Aida, Ken-ichi Ishikawa

Mechanical Engineering Journal, 3(1) 15-00509-1-15-00509-11, Feb 12, 2016 Peer-reviewed
Smart Polishing of Hard-to-Machine Materials with an Innovative Dilatancy Pad under High-Pressure, High-Speed, Immersed Condition

Toshiro K. Doi, Kiyoshi Seshimo, Tsutomu Yamazaki, Masanori Ohtsubo, Daizo Ichikawa, Tadakazu Miyashita, Masataka Takagi, Taku Saeki, Hideo Aida

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 5(10) P598-P607, 2016 Peer-reviewed
Consideration of Femtosecond Laser-induced Effect on Semiconductor Material SiC Substrate for CMP Processing

Chengwu Wang, Syuhei Kurokawa, Toshiro Doi, Yusuhisa Sano, Hideo Aida, Osamu Ohnishi, Michio Uneda, Koki Ohyama, Terutake Hayashi, Ji Zhang …

Applied Mechanics and Materials, 799-800(-) 458-462, Oct 19, 2015 Peer-reviewed
Investigation into chemical mechanical polishing mechanism of hard-to-process materials using a commercially available single-sided polisher

Michio Uneda, Keiichi Takano, Koji Koyama, Hideo Aida, Ken-Ichi Ishikawa

International Journal of Automation Technology, 9(5) 573-579, Sep 1, 2015 Peer-reviewed
Precise mechanical polishing of brittle materials with free diamond abrasives dispersed in micro-nano-bubble water

Hideo Aida, Seong-Woo Kim, Kenjiro Ikejiri, Toshiro Doi, Tsutomu Yamazaki, Kiyoshi Seshimo, Koji Koyama, Hidetoshi Takeda, Natsuko Aota

PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 40(-) 81-86, Apr, 2015 Peer-reviewed
Building of super high-efficiency processing technology based on innovative concept (Establishment of effective polishing process of SiC substrate using Dilatancy pad tool with bowl feed method)

Toshiro K. DOI, Kiyoshi SESHIMO, Tsutomu YAMAZAKI, Masanori OHTSUBO, Hideaki NISHIZAWA, Sachi MURAKAMI, Daizo ICHIKAWA, Yoshio NAKAMURA, Tadakazu MIYASHITA, Yoshihide KAWAMURA …

Transactions of the JSME (in Japanese), 81(824) 14-00618-1-14-00618-13, Feb 20, 2015 Peer-reviewed
Estimation of bowing in hetero-epitaxial GaN-on-sapphire substrate at elevated temperatures by X-ray diffraction rocking curve measurement

Hideo Aida, Seong-woo Kim, Toshimasa Suzuki

JOURNAL OF CRYSTAL GROWTH, 412(-) 60-66, Feb, 2015 Peer-reviewed
Basic study on etching selectivity of plasma chemical vaporization machining by introducing crystallographic damage into work surface

Yasuhisa Sano, Toshiro Doi, Syuhei Kurokawa, Hideo Aida, Osamu Ohnishi, Michio Uneda, Yuu Okada, Hiroaki Nishikawa, Kazuto Yamauchi

Key Engineering Materials, 625(-) 550-553, 2015 Peer-reviewed
Growth of thick GaN layers on laser-processed sapphire substrate by hydride vapor phase epitaxy

Koji Koyama, Hideo Aida, Seong-Woo Kim, Kenjiro Ikejiri, Toshiro Doi, Tsutomu Yamazaki

JOURNAL OF CRYSTAL GROWTH, 403(-) 38-42, Oct, 2014 Peer-reviewed
Evaluation of subsurface damage in GaN substrate induced by mechanical polishing with diamond abrasives

Hideo Aida, Hidetoshi Takeda, Seong-Woo Kim, Natsuko Aota, Koji Koyama, Tsutomu Yamazaki, Toshiro Doi

APPLIED SURFACE SCIENCE, 292(-) 531-536, Feb, 2014 Peer-reviewed
Effects of N-face finishing on geometry of double-side polished GaN substrate

Koji KOYAMA, Hideo AIDA, Michio UNEDA, Hidetoshi TAKEDA, Seong-Woo KIM, Hiroki TAKEI, Tsutomu YAMAZAKI, Toshiro DOI

International Journal of Automation Technology, 8(1) 121-127, Jan 5, 2014 Peer-reviewed

Misc.

次世代型加工プロセスによる難加工性単結晶の研磨とその将来展望

會田英雄, 土肥俊郎

真空ジャーナル, 165(-) 10-14, Jul, 2018 Invited
グリーンデバイス用難加工材料基板の高効率加工プロセス技術と革新的デバイス創出を目指す接合技術

土肥俊郎, 瀬下清, 迫田仁, 山崎努, 土肥英之, 市川大造, 高木正孝, 會田英雄

月刊トライボロジー, 351(ー) 14-18, Nov, 2016 Invited
ヘテロエピタキシャル成長による大口径ダイヤモンド自立基板への挑戦

會田英雄, 金聖祐, 池尻憲次朗, 川又友喜, 藤居大毅, 小山浩司, 澤邊厚仁

NEW DIAMOND, 122(-) 29-30, Jul, 2016 Invited
高効率加工を目指す革新的プラズマ融合CMP技術と難加工材料への適用

土肥俊郎, 會田英雄

光技術コンタクト, 58(-) 35-42, Apr, 2016 Invited
小径基板洗浄機Ecclear(エクリア)

坂本昌隆, 青田奈津子, 石田悠宗, 會田英雄

産業洗浄, 17(-) 15-19, Apr, 2016 Invited
革新的プラズマ融合CMP加工技術とそのダイヤモンド基板加工への応用

會田英雄, 土肥俊郎, 佐野泰久, 黒河修平, 大山幸希, 金聖祐

NEW DIAMOND, 120(-) 33-34, Jan, 2016 Invited
LED用基板材料と超精密加工プロセス:成膜プロセスを理解し最適基板品質を目指す

會田英雄, 青田奈津子, 武田秀俊

光技術コンタクト, 53(-) 36-42, Nov, 2015 Invited
GaN基板加工における加工変質層解析とその制御

會田英雄, 武田秀俊, 小山浩

機械技術, 62(-) 34-37, Sep, 2014 Invited
ベルジャー型研磨装置による高能率ガラス研磨技術と難加工材料への応用

土肥俊郎, 山崎努, 會田英雄

機械技術, 60(-) 33-36, Apr, 2012 Peer-reviewedInvited
オプトエレクトロニクス用単結晶基板の精密加工技術:サファイア・窒化ガリウム・炭化ケイ素基板の超精密CMPと表面ダメージの評価

會田英雄

光技術コンタクト, 49(-) 16-21, Dec, 2011 Invited

Books and Other Publications

Advances in Chemical Mechanical Planarization (CMP)

Hideo Aida

Elsevier, Jan 8, 2016
Handbook of Ceramics Grinding and Polishing

Hideo Aida

Elsevier, Nov 7, 2014
精密加工と微細構造の形成技術

會田英雄, 武田秀俊, 土肥俊郎 (Role: Joint author, GaN単結晶素材の精密加工と加工変質層への評価(pp.164–170))

技術情報協会, Jul 1, 2013
GaNパワーデバイスの技術展開

土肥俊郎, 會田英雄, 小山浩二, 武田秀俊 (Role: Joint author, GaN結晶基板の超精密加工技術(pp.141—157))

S&T出版, Apr 25, 2012

Presentations

難加工単結晶材料の超精密加工～ファインバブル水を用いた研磨加工事例～

ファインバブル技術講習会, Jan 23, 2018, 新潟県工業技術総合研究所
次世代オプトエレクトロニクス単結晶とその超精密加工技術

接合界面創成技術大191委員会研究会, Nov 17, 2017, 日本学術振興会大191委員会 Invited
High Efficiency Surface Planarization of Single Crystal Diamond Substrate by Plasma Fusion Chemical Mechanical Polishing

The 11th Asian-European International Conference on Plasma Surface Engineering, Sep 12, 2017, Applied Plasma Science and Engneering
Fabrication of freestanding heteroepitaxial diamond substrate via micropatterns and microneedles

応用物理学会秋季学術講演会, Sep 7, 2017, 応用物理学会 Invited
次世代オプトエレクトロニクス単結晶の精密加工技術とその応用

にいがたナノ基盤技術実践会, Jul 3, 2017, 長岡産業活性化協会
Plasma fusion chemical mechanical polishing as a next generation processing technology and its applications to SiC, GaN, and diamond substrates

The 10th MIRAI Conference, Jun 28, 2017, MIRAI Institute
GaN基板のプラズマ融合CMPプロセス～エタノールバブリング・Arプラズマを用いたプラズマ融合CMP特性とその評価～

有機エレクトロニクス/シリコン材料・デバイス研究会, Apr 21, 2017, 電子情報通信学会