MISC

査読有り
2014年5月

Magnetization control for bit pattern formation of spinel ferromagnetic oxides by Kr ion implantation

JOURNAL OF APPLIED PHYSICS
  • Eiji Kita
  • ,
  • Kazuya Z. Suzuki
  • ,
  • Yang Liu
  • ,
  • Yuji Utsumi
  • ,
  • Jumpei Morishita
  • ,
  • Daiki Oshima
  • ,
  • Takeshi Kato
  • ,
  • Tomohiko Niizeki
  • ,
  • Ko Mibu
  • ,
  • Hideto Yanagihara

115
17
開始ページ
17B907
終了ページ
記述言語
英語
掲載種別
速報,短報,研究ノート等(学術雑誌)
DOI
10.1063/1.4868704
出版者・発行元
AMER INST PHYSICS

As a first step toward the development of bit-patterned magnetic media made of oxides, we investigated the effectiveness of magnetism control by Kr implantation in a typical spinel ferromagnetic oxide, Fe3O4. We implanted Kr ions accelerated at 30 kV on 13-nm-thick Fe3O4 thin films at dosages of (1-40) x 10(14) ions/cm(2). Magnetization decreased with increase in ion dosages and disappeared when irradiation was greater than 2 x 10(15) ions/cm(2) of Kr ions. These dosages are more than ten times smaller than that used in the N-2 implantation for metallic and oxide ferromagnets. Both the temperature dependence of magnetization and the Mossbauer study suggest that the transition of Fe3O4 from ferromagnetic to paramagnetic took place sharply due to Kr ion irradiation, which produces two-phase separation-ferromagnetic and nonmagnetic with insufficient dosage of Kr ions. (C) 2014 AIP Publishing LLC.

リンク情報
DOI
https://doi.org/10.1063/1.4868704
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000335643700290&DestApp=WOS_CPL
ID情報
  • DOI : 10.1063/1.4868704
  • ISSN : 0021-8979
  • eISSN : 1089-7550
  • Web of Science ID : WOS:000335643700290

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