MISC

招待有り
2010年7月

イオン照射型ビットパターン媒体の現状

電気学会論文誌A
  • 加藤剛志
  • ,
  • 大島大輝
  • ,
  • Edi Suharyadi
  • ,
  • 岩田聡
  • ,
  • 綱島滋

130
7
開始ページ
613-620
終了ページ
620
記述言語
日本語
掲載種別
記事・総説・解説・論説等(学術雑誌)
DOI
10.1541/ieejfms.130.613
出版者・発行元
The Institute of Electrical Engineers of Japan

Recent progress of the bit patterned media fabricated by ion irradiation method is reviewed. High energy ion irradiation is a useful method to modify the magnetic properties and this technique can be used to fabricate high density bit patterned media which is a promising candidate to overcome the limit of the areal density of the conventional recording media. In order to achieve magnetic patterned structure having the feature size less than 50 nm by the ion irradiation technique, the materials whose magnetic order is easily suppressed by low dose ion irradiation are necessary. One of the candidate is L12 phase CrPt3, and the control of the magnetic order of CrPt3 by the ion irradiation and the fabrication of CrPt3 bit patterned medium are discussed.

リンク情報
DOI
https://doi.org/10.1541/ieejfms.130.613
CiNii Articles
http://ci.nii.ac.jp/naid/10026865099
CiNii Books
http://ci.nii.ac.jp/ncid/AN10136312
URL
http://id.ndl.go.jp/bib/10740718
URL
https://jlc.jst.go.jp/DN/JALC/00353097153?from=CiNii
ID情報
  • DOI : 10.1541/ieejfms.130.613
  • ISSN : 0385-4205
  • CiNii Articles ID : 10026865099
  • CiNii Books ID : AN10136312

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