東 欣吾

Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system 

DIAMOND AND RELATED MATERIALS 101 2020年1月  査読有り

Effect of a Magnetic Filter Across the Exit Hole of a Flat Oxygen Plasma Source 

PLASMA AND FUSION RESEARCH 14 2019年6月  査読有り

Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges 

VACUUM 157 192-201 2018年11月  査読有り

Plasma based nitrogen ion implantation to hydrogenated diamond-like carbon films 

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 433 87-92 2018年10月  査読有り

Preparation of TiN films by reactive high-power pulsed sputtering Penning discharges 

JAPANESE JOURNAL OF APPLIED PHYSICS 57(6) 2018年6月  査読有り

Preparation of Titanium-Doped Diamond-Like Carbon Films With Electrical Conductivity Using High Power Pulsed Magnetron Sputtering System With Bipolar Pulse Voltage Source for Substrate 

IEEE TRANSACTIONS ON PLASMA SCIENCE 44(12) 3083-3090 2016年12月  査読有り

Plasma Parameters of Titanium-Based Metallic Plasma Generated by a Compact-Type High-Power Pulsed Sputtering Penning Discharge 

IEEE TRANSACTIONS ON PLASMA SCIENCE 44(12) 3201-3206 2016年12月  査読有り

Properties of diamond-like carbon films prepared by high power pulsed sputtering with two facing targets 

SURFACE & COATINGS TECHNOLOGY 307 1053-1058 2016年12月  査読有り

Surface treatment of diamond-like carbon films by reactive Ar/CF4 high-power pulsed magnetron sputtering plasmas 

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 365 155-158 2015年12月  査読有り

Growth Rate of Titanium Thin Film by High-Power Pulsed Sputtering (HPPS) Penning Discharge Plasma with the Inner Electrode 

11TH APCPST (ASIA PACIFIC CONFERENCE ON PLASMA SCIENCE AND TECHNOLOGY) AND 25TH SPSM (SYMPOSIUM ON PLASMA SCIENCE FOR MATERIALS) 441(1) 2013年  査読有り

大電力パルススパッタリングプラズマ源 

電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals and Materials Society 132(4) 272-277 2012年4月1日  

Metal Ionization in a High-Power Pulsed Sputtering Penning Discharge 

IEEE TRANSACTIONS ON PLASMA SCIENCE 39(11) 3125-3132 2011年11月  査読有り

Comparative study of high-power pulsed sputtering (HPPS) glow plasma techniques using Penning discharge and hollow-cathode discharge 

SURFACE & COATINGS TECHNOLOGY 206(5) 938-942 2011年11月  査読有り

Surface Modification of Material by Irradiation of Low Power Atmospheric Pressure Plasma Jet 

NEW TREND IN APPLIED PLASMA SCIENCE AND TECHNOLOGY 1282 92-+ 2010年  査読有り

Electrical and Optical Characteristics of High-Power Pulsed Sputtering Glow Discharge 

IEEE TRANSACTIONS ON PLASMA SCIENCE 37(7) 1178-1188 2009年7月  査読有り