In this paper, the structure zone model (SZM) for sputter-deposited thin films is reviewed through a systematic discussion of the dependence of film structure and properties on the discharge pressure and homologous substrate temperature. The SZM is applicable to the sputter-deposited metal and metal oxide thin films with a film thickness ranging from a few to several hundred nanometers. Furthermore, the SZM is evolved for the sputter-deposition of films through energization of the sputtered particles by replacing the axis of the deposition pressure with that of the effective energy per depositing atom. The results suggest that the SZM is valid as a conceptual diagram with respect to optimizing film-deposition conditions for industrial applications.<br />
<br />
Keywords: Structure zone model, Sputtering