KUSANO EIJI

Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF4, Mg–O2, and Ti–O2 discharges by probe measurements

Eiji Kusano

Journal of Vacuum Science & Technology A, 42(2), Feb 2, 2024 Peer-reviewedLead authorCorresponding author

Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films

Eiji Kusano

Journal of Vacuum Science & Technology A, 40(5) 053405-1-053405-14, Sep, 2022 Peer-reviewedLead authorCorresponding author

Growth of flat-topped, mound-shaped grains with voids when depositing silver thin films at high substrate temperatures using direct-current magnetron sputtering

Eiji Kusano

Journal of Vacuum Science & Technology A, 40(1) 013410-1-013410-12, Jan, 2022 Peer-reviewedLead authorCorresponding author

Discharge characteristics of electronegative Mg–CF4 direct current magnetron sputtering by probe measurements

Eiji Kusano

Journal of Applied Physics, 129(23) 233305-1-233305-20, Jun 21, 2021 Peer-reviewedLead authorCorresponding author

Structure-Zone Modeling of Sputter-Deposited Thin Films: A Brief Review

KUSANO EIJI

Applied Science and Convergence Technology, 28(6) 179-185, Dec, 2019 Peer-reviewedInvitedLead authorCorresponding author

Homologous substrate-temperature dependence of structure and properties of TiO<inf>2</inf>, ZrO<inf>2</inf>, and HfO<inf>2</inf> thin films deposited by reactive sputtering

Kusano, E.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 37(5)-051508-8, 2019 Peer-reviewedLead authorCorresponding author

Revisitation of the structure zone model based on the investigation of the structure and properties of Ti, Zr, and Hf thin films deposited at 70-600 C using DC magnetron sputtering

KUSANO EIJI

Journal of Vacuum Science & Technology A, 36(4) 41506-1-41506-9, Jul, 2018 Peer-reviewedLead authorCorresponding author

Radio frequency sputter deposition of Cu<inf>2</inf>ZnSnS<inf>4</inf> thin films with a temperature-controlled reflector wall: Effects of H<inf>2</inf> addition to the sputtering gas

Kusano, E., Kondo, Y.

Thin Solid Films, 646 75-82, 2018 Peer-reviewedLead authorCorresponding author

Mechanisms of the structural modification of Ti films by pulsed direct current and inductively coupled plasma-assisted pulsed direct current sputtering

Eiji Kusano, Naoto Kikuchi

THIN SOLID FILMS, 634(31) 73-84, Jul, 2017 Peer-reviewedLead authorCorresponding author

Control of composition and properties by the use of reflector wall in RF sputter deposition of Cu<inf>2</inf>ZnSnS<inf>4</inf> thin films

Kusano, E., Sakamoto, M.-A.

Thin Solid Films, 589(31) 433-440, 2015 Peer-reviewedLead authorCorresponding author

Evaluation of time-dependent compound layer formation and removal at target surface by model calculation of mass balance change in reactive sputtering

KUSANO EIJI, SAKAMOTO MUNEAKI

19th International Vacuum Congress IVC-19 Paris, Sep, 2013

One-step deposition of Cu2ZnSnS4 thin films by hot-wall sputtering

SAKAMOTO MUNEAKI, KUSANO EIJI

Proceedings of the 12th International Symposium on Sputtering and Plasma Processes, 12th 388-391, Jul, 2013 Peer-reviewedCorresponding author

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Model calculation of dynamic mass-balance changes in reactive sputtering

KUSANO EIJI

Proceedings of the 12th International Symposium on Sputtering and Plasma Processes, 12th 10-13, Jul, 2013 Peer-reviewedLead authorCorresponding author

Structure modification of titanium oxide thin films by rf-plasma assistance in Ti-O<inf>2</inf> reactive dc and pulsed dc sputtering

Sakamoto, M.-A., Kusano, E., Matsuda, H.

Thin Solid Films, 531 49-55, 2013 Peer-reviewedCorresponding author

Interface stress induced hardness enhancement and superelasticity in polytetrafluoroethylene/metal multilayer thin films

E. Kusano, N. Kikuchi

THIN SOLID FILMS, 520(1) 404-412, Oct, 2011 Peer-reviewedLead authorCorresponding author

Densification of titanium oxide thin films by rf-plasma assistance in Ti-O2 reactive dc and pulsed sputtering

KUSANO EIJI, SAKAMOTO MUNEAKI

Proc Int Symp Sputtering Plasma Processes, 11th 219-222, Jul, 2011 Peer-reviewedLead author

The 10th Asia-Pacific conference on Plasma Science and Technology (APCPST 2010): The 153rd symposium on Plasma Science for Materials (SPSM 2010)

Chae, H.Y., Chung, C.W., Chung, J.W., Hong, M.P., Joo, J.H., Kim, H.J., Kim, D.H., Kusano, E., Overzet, L., Pu, Y.-K. …

Thin Solid Films, 519(20), 2011

Effects of radio-frequency plasma on structure and properties in Ti film deposition by dc and pulsed dc magnetron sputtering

Toshiyuki Oya, Eiji Kusano

THIN SOLID FILMS, 517(20) 5837-5843, Aug, 2009 Peer-reviewedCorresponding author

Modfication of Structure and Properties in Indium Tin Oxide Films Deposited by Rf-plasma-assisted Pulsed Dc Sputtering

OYA Toshiyuki, KUSANO Eiji

Journal of Vacuum Society of Japan, 52(6) 364-368, 2009 Peer-reviewedLead authorCorresponding author

Characterization of organic polymer thin films deposited by rf magnetron sputtering

Toshiyuki Oya, Eiji Kusano

VACUUM, 83(3) 564-568, Oct, 2008 Peer-reviewedLast authorCorresponding author

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