MISC

2007年8月

Evaluation of capacitance-voltage characteristics for high voltage SiC-JFET

IEICE ELECTRONICS EXPRESS
  • Tsuyoshi Funaki
  • ,
  • Tsunenobu Kimoto
  • ,
  • Takashi Hikihara

4
16
開始ページ
517
終了ページ
523
記述言語
英語
掲載種別
DOI
10.1587/elex.4.517
出版者・発行元
IEICE-INST ELECTRONICS INFORMATION COMMUNICATIONS ENG

Capacitance between terminals of a power semiconductor device substantially affects on its switching operation. This paper presents a capacitance - voltage ( C - V) characterization system for measuring high voltage SiC - JFET and the results. The C - V characterization system enables one to impose high drain- source voltage to the device and extracts the capacitance between two of three terminals in FET by eliminating its influence on the neighboring terminal. The capacitance between the gate and drain, and the drain and source represents the hybrid structure of the lateral channel and vertical drift layer of the SiC - JFET.

リンク情報
DOI
https://doi.org/10.1587/elex.4.517
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000249718900006&DestApp=WOS_CPL
ID情報
  • DOI : 10.1587/elex.4.517
  • ISSN : 1349-2543
  • Web of Science ID : WOS:000249718900006

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