論文

2021年4月

Charge-Discharge Performance of Copper Metal Positive Electrodes in Fluorohydrogenate Ionic Liquids for Fluoride-Shuttle Batteries

JOURNAL OF THE ELECTROCHEMICAL SOCIETY
  • Takayuki Yamamoto
  • ,
  • Kazuhiko Matsumoto
  • ,
  • Rika Hagiwara
  • ,
  • Toshiyuki Nohira

168
4
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1149/1945-7111/abf698
出版者・発行元
ELECTROCHEMICAL SOC INC

In search of room-temperature electrolytes for fluoride-shuttle batteries, fluorohydrogenate ionic liquids (FHILs) have emerged, showing high ionic conductivities and better operational practicality. To enhance the performance of these electrolytes, the charge-discharge behavior of copper metal as positive electrodes in FHILs was investigated in this study. In the [C(2)C(1)im][(FH)(2.3)F] (C(2)C(1)im = 1-ethyl-3-methylimidazolium) FHIL electrolyte, although the 1st discharge capacity of 599 mAh (g-Cu)(-1) included the reductive reaction of surface oxide films, the 2nd discharge capacity of 444 mAh (g-Cu)(-1) that corresponds to 53% of the theoretical capacity was achieved. However, the capacity declines to 167 mAh (g-Cu)(-1) at the 20th cycle, indicating low capacity retention. In contrast, the adoption of [C(2)C(1)pyrr][(FH)(2.3)F] (C(2)C(1)pyrr = N-ethyl-N-methylpyrrolidinium) electrolyte confers improved cycleability across the cycles with a higher discharge capacity of 210 mAh (g-Cu)(-1) at the 20th cycle. Scanning electron microscopy and energy-dispersive X-ray spectroscopy performed on the electrode surfaces confirm reduced electrode degradation characterized by suppressed aggregation of copper particles in [C(2)C(1)pyrr][(FH)(2.3)F] due to its low CuF2 solubility compared with [C(2)C(1)im][(FH)(2.3)F]. Herein, we demonstrate the use of FHILs with low CuF2 solubilities as a strategy for improving the charge-discharge performance of copper metal positive electrodes in fluoride-shuttle batteries.

リンク情報
DOI
https://doi.org/10.1149/1945-7111/abf698
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000644927900001&DestApp=WOS_CPL
ID情報
  • DOI : 10.1149/1945-7111/abf698
  • ISSN : 0013-4651
  • eISSN : 1945-7111
  • Web of Science ID : WOS:000644927900001

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