1999年
Recent progress of obliquely deposited thin films for industrial applications
ENGINEERED NANOSTRUCTURAL FILMS AND MATERIALS
- ,
- ,
- 巻
- 3790
- 号
- 開始ページ
- 94
- 終了ページ
- 105
- 記述言語
- 英語
- 掲載種別
- 研究論文(国際会議プロシーディングス)
- DOI
- 10.1117/12.351241
- 出版者・発行元
- SPIE-INT SOC OPTICAL ENGINEERING
More than 10 years ago, birefringent films of metal oxides were formed by oblique vapor deposition and investigated with a view of their application to optical retardation plates. The retardation function of the films was explained in terms of the birefringence caused by the characteristic anisotropic nanostructure inside the films. These films are now classified in the genre of the so-called sculptured thin films. However, the birefringent films thus prepared are not yet industrialized even now due to the crucial lack of the durability and the yield of products. In this review paper, we describe the present status of application process of the retardation films to the information systems such as compact disc and digital versatile disc devices with a special emphasis on the uniformity of retardation properties in a large area and the stability of the optical properties of the obliquely deposited thin films. Finally, future challenges for wide application of the obliquely deposited thin films are also discussed.
- リンク情報
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- DOI
- https://doi.org/10.1117/12.351241
- Web of Science
- https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000082519200010&DestApp=WOS_CPL
- URL
- http://www.scopus.com/scopus/inward/record.url?eid=2-s2.0-0033359269&partner=40&rel=R5.0.4
- ID情報
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- DOI : 10.1117/12.351241
- ISSN : 0277-786X
- Web of Science ID : WOS:000082519200010