論文

査読有り
2012年10月

Selective Adsorption of Thiol Molecules at Sulfur Vacancies on MoS2(0001), Followed by Vacancy Repair via S-C Dissociation

JOURNAL OF PHYSICAL CHEMISTRY C
  • Marina Makarova
  • ,
  • Yuji Okawa
  • ,
  • Masakazu Aono

116
42
開始ページ
22411
終了ページ
22416
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1021/jp307267h
出版者・発行元
AMER CHEMICAL SOC

For the development of various molecular nanostructures such as single-molecule electronic circuits, it is very important to fix the molecular components at predetermined positions on a substrate. We report the fixation of the thiol derivatives dodecanethiol and (3-mercaptopropyl)-trimethoxysilane (MPS) on a MoS2(0001) substrate at prefabricated sulfur vacancies. Scanning tunneling microscopy (STM) reveals the selective bonding of thiol groups to the Mo atoms at the vacancy defects. In addition, we report STM tip induced dissociation of the S-C bond, which essentially results in the repair of the vacancy defects with sulfur atoms from the thiols. This is consistent with the high desulfurization reactivity of MoS2. Because of its structure and composition, MPS has a higher dissociation reactivity than that of dodecanethiol.

Web of Science ® 被引用回数 : 72

リンク情報
DOI
https://doi.org/10.1021/jp307267h
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000310121000038&DestApp=WOS_CPL

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