2016年11月27日
Sub-Nanoporous Carbon Thin Films Grown by Plasma-Enhanced Chemical Vapor Deposition Method
2016 MRS Fall Meeting
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- 記述言語
- 英語
- 会議種別
A sub-nanoporous carbon thin film has been considered as a promising candidate for a next- generation robust reverse osmosis (RO) membrane. We focused on fabrication of carbon thin films using plasma-enhanced chemical vapor deposition (PECVD) method. Here we present how we can introduce sub-nanometer pores in a carbon thin film and control its size and porosity by tuning plasma parameters.