講演・口頭発表等

2016年11月27日

Sub-Nanoporous Carbon Thin Films Grown by Plasma-Enhanced Chemical Vapor Deposition Method

2016 MRS Fall Meeting
  • SAMITSU
  • ,
  • Sadaki
  • ,
  • ICHINOSE, Izumi

記述言語
英語
会議種別

A sub-nanoporous carbon thin film has been considered as a promising candidate for a next- generation robust reverse osmosis (RO) membrane. We focused on fabrication of carbon thin films using plasma-enhanced chemical vapor deposition (PECVD) method. Here we present how we can introduce sub-nanometer pores in a carbon thin film and control its size and porosity by tuning plasma parameters.