Aluminum nitride (AIN) high thermal conductivity and chemical stability has attracted wide attention in a diverse range of electrical and electronic applications. However, it was impossible to fabricate the AIN coatings directly in the conventional thermal spray techniques. It is due to the AIN particles decomposition in the high temperature without any stable melting or semi-melting phases, which prevents it deposition. Using the reactivity of the plasma to fabricate the AIN thermal sprayed coatings is a promising solution. This study will investigate the feasibility of reactive spraying aluminum nitride-alumina-yttria mixtures in nitrogen ambient and its effect on the coatings properties. Several AIN based coatings were successfully fabricated. The coatings consist of/7-AIN, c-AIN, Al S O E N, Y-A 1 2 O 3 , a-AI 2 O 3 and aluminum yttrium oxide. The fabrication process, nitride content and coating microstructure significantly affected with using the yttria addition. However, due to the high oxide content and porosity of the as-sprayed coatings it was difficult to reach high thermal conductivity AIN coatings directly. Increasing the AIN content and assisting the sintering during the heat-treatment were investigated to fabricate AIN coatings with high thermal conductivity (90 W/m.K), high AIN content and low porosity.