論文

査読有り
2011年11月

Low-damage milling of an amino acid thin film with cluster ion beam

JOURNAL OF APPLIED PHYSICS
  • Masaki Hada
  • ,
  • Sachi Ibuki
  • ,
  • Yusaku Hontani
  • ,
  • Yasuyuki Yamamoto
  • ,
  • Kazuya Ichiki
  • ,
  • Satoshi Ninomiya
  • ,
  • Toshio Seki
  • ,
  • Takaaki Aoki
  • ,
  • Jiro Matsuo

110
9
開始ページ
094701
終了ページ
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1063/1.3658220
出版者・発行元
AMER INST PHYSICS

In this work, we characterized the surface damage layer and sputtering yield of polycrystalline L-leucine films before and after irradiation with Ar cluster or monomer ion beams with x ray photoelectron spectroscopy and ellipsometry. Irradiation with Ar monomer ion beams induced heavy damage on the surface of L-leucine films, such as bond breaking and carbonization. In contrast, no significant surface damage was observed in the films irradiated with Ar cluster ion beams. The sputtering yield of L-leucine decreased dramatically with increasing fluence of monomer Ar ions and approached the value of the sputtering yield of graphite; but under irradiation with Ar cluster ion beams, the sputtering yield remained constant with fluence. The differences in sputtering yield behavior were explained in relation with the surface damage layer on organic materials. Thus, cluster ion beams could potentially be used to mill down biological materials without significant damage on the surface and could contribute to various applications in the analysis and processing of life matter. (C) 2011 American Institute of Physics. [doi:10.1063/1.3658220]

リンク情報
DOI
https://doi.org/10.1063/1.3658220
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000297062100129&DestApp=WOS_CPL
URL
http://repository.kulib.kyoto-u.ac.jp/dspace/handle/2433/160646
ID情報
  • DOI : 10.1063/1.3658220
  • ISSN : 0021-8979
  • Web of Science ID : WOS:000297062100129

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