2006年1月
ITO surface smoothing with argon cluster ion beam
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
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- 巻
- 242
- 号
- 1-2
- 開始ページ
- 140
- 終了ページ
- 142
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1016/j.nimb.2005.08.062
- 出版者・発行元
- ELSEVIER SCIENCE BV
Argon gas cluster ion beam (GCIB) was employed to improve the surface smoothness of indium tin oxide (ITO) substrates. The dependence of the smoothness as well as of the sputtered depth on cluster ion energy and dose has been studied. Results show that relatively low-energy (10 keV) clusters with mean size of 2000 Ar atoms are sufficient to reduce the mean roughness of the ITO surface to about one fourth of its initial value.
Organic electroluminescent (EL) devices (alpha-NPD/Alq(3)/Mg-Ag) were formed on the smoothed surfaces and a considerable improve of the devices' EL efficiency was observed. (c) 2005 Elsevier B.V. All rights reserved.
Organic electroluminescent (EL) devices (alpha-NPD/Alq(3)/Mg-Ag) were formed on the smoothed surfaces and a considerable improve of the devices' EL efficiency was observed. (c) 2005 Elsevier B.V. All rights reserved.
- リンク情報
- ID情報
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- DOI : 10.1016/j.nimb.2005.08.062
- ISSN : 0168-583X
- Web of Science ID : WOS:000236225200037