論文

査読有り
2005年6月

Size and energy distribution of gas cluster ion beam measured by energy resolved time of flight mass spectroscopy

SURFACE & COATINGS TECHNOLOGY
  • S Kakuta
  • ,
  • T Seki
  • ,
  • S Sasaki
  • ,
  • K Furusawa
  • ,
  • T Aoki
  • ,
  • J Matsuo

196
1-3
開始ページ
198
終了ページ
202
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/j.surfcoat.2004.08.129
出版者・発行元
ELSEVIER SCIENCE SA

Energy resolved time of flight (ERTOF) mass spectroscopy has been developed to measure the energy and size distributions in a gas cluster ion beam (GCIB). Gas cluster ions, being aggregates of a few to several thousands of atoms, were generated by the ionization of neutral clusters, which were created by the adiabatic expansion of a high pressure gas into a vacuum. As a result of the large cross section of cluster ions, the cluster size can be easily reduced by collision with fast neutrals and monomer ions.
An ERTOF system consisted of a retarding grid in front of a drift tube with a pair of deflection electrodes that acted as a gate. This system was attached to an ionization chamber, where Ar gas clusters, generated by a nozzle in a source chamber, were ionized by electron impact. Current waveforms were measured with ERTOF as an increasing voltage was applied to the retarding grid. The size distribution of clusters having a particular kinetic energy was calculated from the difference in the current waveform obtained at a corresponding retarding voltage to that at a larger voltage.
Using ERTOF, it was found that the GCIB consisted of two components; small sized clusters with low kinetic energy and large sized clusters with high kinetic energy. It was also noted that the depth to which a substrate, on which the cluster beam impinged, was etched increased with the proportion of large clusters to the GCIB, since the small clusters, resulting from disintegration of large sized clusters by collisions with monomer ions, fast neutrals and residual gas molecules, have too low a kinetic energy to remove atoms from the surface. Note that the etched depth was affected by both the energy and size distribution of cluster ions. Therefore, ERTOF measurement could be utilized to assure the reproducibility of processes for the manufacture of semiconductors and magnetic recording heads. (c) 2004 Elsevier B.V. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/j.surfcoat.2004.08.129
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000229375600039&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.surfcoat.2004.08.129
  • ISSN : 0257-8972
  • Web of Science ID : WOS:000229375600039

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