2015年12月28日
Effect of Epitaxial Growth of Gold Nanoparticles on Si Substrates on Adhesion of Electrolessly Deposited Metal Films
ECS Transactions
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- 巻
- 69
- 号
- 39
- 開始ページ
- 59
- 終了ページ
- 63
- 記述言語
- 英語
- 掲載種別
- 研究論文(国際会議プロシーディングス)
- DOI
- 10.1149/06939.0059ecst
- 出版者・発行元
- The Electrochemical Society
Electrolessly deposited metal films on silicon substrates using gold nanoparticles as catalysts yield much higher adhesion than that by using palladium or silver nanoparticles. In this study, the structure of the gold nanoparticles is analyzed by X-ray diffraction and transmission electron microscopy. Single crystalline gold nanoparticles are epitaxially deposited on silicon substrates and silicon-gold alloy is formed at the interface. Those epitaxially grown gold nanoparticles cause the high adhesion of electrolessly deposited nickel films on silicon substrates.
- リンク情報
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- DOI
- https://doi.org/10.1149/06939.0059ecst
- 共同研究・競争的資金等の研究課題
- 貴金属ナノ粒子のシリコンへの無電解析出のグリーンサステイナブル展開
- URL
- https://syndication.highwire.org/content/doi/10.1149/06939.0059ecst
- Scopus
- https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84959303349&origin=inward
- Scopus Citedby
- https://www.scopus.com/inward/citedby.uri?partnerID=HzOxMe3b&scp=84959303349&origin=inward
- ID情報
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- DOI : 10.1149/06939.0059ecst
- ISSN : 1938-6737
- eISSN : 1938-5862
- ISBN : 9781607685395
- SCOPUS ID : 84959303349