Asahiko Matsuda

J-GLOBAL         Last updated: Nov 15, 2019 at 13:03
 
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Name
Asahiko Matsuda
Affiliation
National Institute for Materials Science
Section
Research and Services Division of Materials Data and Integrated System
Job title
Engineer
Degree
Ph.D. in Engineering(Kyoto University)
ORCID ID
0000-0001-5989-027X

Profile

I'm an engineer working to realize a next-generation data repository as a place for more advanced materials research. Former researcher on semiconductor devices and plasma etching.

Research Areas

 
 

Academic & Professional Experience

 
Oct 2018
 - 
Today
Engineer, Research and Services Division of Materials Data and Integrated System, National Institute for Materials Science
 
Apr 2017
 - 
Sep 2018
Postdoctoral Researcher, Research and Services Division of Materials Data and Integrated System, National Institute for Materials Science
 
May 2015
 - 
Mar 2017
Postdoctoral Researcher, International Center for Materials Nanoarchitectonics, National Institute for Materials Science
 
May 2013
 - 
Apr 2015
Guest Researcher, Physical Measurement Laboratory, National Institute of Standards and Technology
 
Apr 2011
 - 
Mar 2013
Research Fellow, Japan Society for the Promotion of Science
 

Awards & Honors

 
Nov 2015
Effects of straggling of incident ions on plasma-induced damage creation in "fin"-type field-effect transistors, DPS Paper Award, 37th International Symposium on Dry Process
Winner: Koji Eriguchi, Asahiko Matsuda, Yoshinori Takao and Kouichi Ono
 
May 2014
Young Oak Sapling Award, Kashinomekai
 
Nov 2011
Advanced contactless analysis of plasma-induced damage on Si by temperature-controlled photoreflectance spectroscopy, DPS 2010 Young Researcher Award, 32nd International Symposium on Dry Process
 
Aug 2011
Model for Bias Frequency Effects on Plasma-Damaged Layer Formation in Si Substrates, JSAP Outstanding Paper Award, The Japan Society of Applied Physics
Winner: Koji Eriguchi, Yoshinori Nakakubo, Asahiko Matsuda, Yoshinori Takao, and Kouichi Ono
 
Nov 2010
Threshold Voltage Instability Induced by Plasma Process Damage in Advanced MOSFETs, Best Paper Award, 31st International Symposium on Dry Process
Winner: Koji Eriguchi, Yoshinori Nakakubo, Asahiko Matsuda, Yoshinori Takao, and Kouichi Ono
 

Published Papers

 
Mohamed Barakat Zakaria, Takahiro Nagata, Asahiko Matsuda, Yudai Yasuhara, Atsushi Ogura, Md Shahriar A. Hossain, Motasim Billah, Yusuke Yamauchi, and Toyohiro Chikyow
ACS Applied Nano Materials      Jan 2018   [Refereed]
Zakariae Chbili, Asahiko Matsuda, Jaafar Chbili, Jason T. Ryan, Jason P. Campbell, Mhamed Lahbabi, Dimitris E. Ioannou, Kin P. Cheung
IEEE Transactions on Electron Devices   63(9) 3605   Sep 2016   [Refereed]
Jason T. Ryan, Asahiko Matsuda, Jason P. Campbell, Kin P. Cheung
Applied Physics Letters   106(16) 163503   Apr 2015   [Refereed]
Eriguchi K, Matsuda A, Takao Y, Ono K
Japanese Journal of Applied Physics   53(3 SPEC. ISSUE 2)    2014   [Refereed]
Matsuda A, Nakakubo Y, Takao Y, Eriguchi K, Ono K
Japanese Journal of Applied Physics   53(3 SPEC. ISSUE 2)    2014   [Refereed]
Koji Eriguchi, Asahiko Matsuda, Yoshinori Nakakubo, Yoshinori Takao, Kouichi Ono
IEICE Technical Report   113(247) 37-40   Oct 2013
Yoshinori Nakakubo, Koji Eriguchi, Asahiko Matsuda, Yoshinori Takao, Kouichi Ono
IEICE Technical Report   111(249) 73-78   Oct 2011
Koji Eriguchi, Yoshinori Nakakubo, Asahiko Matsuda, Yoshinori Takao, Kouichi Ono
IEICE Technical Report   111(249) 73-78   Oct 2011   [Invited]
Eriguchi K, Nakakubo Y, Matsuda A, Kamei M, Takao Y, Ono K
Japanese Journal of Applied Physics   50(8 PART 3)    2011   [Refereed]
Fukasawa M, Nakakubo Y, Matsuda A, Takao Y, Eriguchi K, Ono K, Minami M, Uesawa F, Tatsumi T
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films   29(4)    2011   [Refereed]
Matsuda A, Nakakubo Y, Takao Y, Eriguchi K, Ono K
Japanese Journal of Applied Physics   50(8 PART 3)    2011   [Refereed]
Eriguchi K, Nakakubo Y, Matsuda A, Kamei M, Takao Y, Ono K
Japanese Journal of Applied Physics   49(8 PART 2)    2010   [Refereed]
Eriguchi K, Nakakubo Y, Matsuda A, Kamei M, Takao Y, Ono K
Japanese Journal of Applied Physics   49(4 PART 2)    2010   [Refereed]
Eriguchi K, Nakakubo Y, Matsuda A, Takao Y, Ono K
Japanese Journal of Applied Physics   49(5 PART 1) 0562031-05620311   2010   [Refereed]
Matsuda A, Nakakubo Y, Takao Y, Eriguchi K, Ono K
Thin Solid Films   518(13) 3481-3486   2010   [Refereed]
Nakakubo Y, Matsuda A, Fukasawa M, Takao Y, Tatsumi T, Eriguchi K, Ono K
Japanese Journal of Applied Physics   49(8 PART 2)    2010   [Refereed]
Eriguchi K, Matsuda A, Nakakubo Y, Kamei M, Ohta H, Ono K
IEEE Electron Device Letters   30(7) 712-714   2009   [Refereed]
Eriguchi K, Nakakubo Y, Matsuda A, Takao Y, Ono K
IEEE Electron Device Letters   30(12) 1275-1277   2009   [Refereed]
Eriguchi K, Nakakubo Y, Matsuda A, Kamei M, Ohta H, Nakagawa H, Hayashi S, Noda S, Ishikawa K, Yoshimaru M, Ono K
Technical Digest - International Electron Devices Meeting, IEDM      2008   [Refereed]

Conference Activities & Talks

 
Asahiko Matsuda
Japan Open Science Summit 2019   28 May 2019   
Asahiko Matsuda, Hideki Yoshikawa, Masashi Ishii, Masahiko Demura
RDA's 13th Plenary Meeting   2 Apr 2019   Research Data Alliance
A constellation of research data systems is being developed, to boost a more data-oriented approach to materials science. Four main functionalities were identified as what such a platform should provide: data generation, storage, utilization, and ...
Asahiko Matsuda, Hideki Yoshikawa, Mineharu Suzuki
Advanced Measurement and Characterization Symposium 2019   7 Mar 2019   Research Center for Advnaced Measurement and Characterization
Takahiro Nagata, Shigenori Ueda, Yoshiyuki Yamashita, Asahiko Matsuda, Toyohiro Chikyow
10th International Workshop on Combinatorial Materials Science and Technology (COMBI2018)   3 Oct 2018   
Asahiko Matsuda, Hideki Yoshikawa, Toyohiro Chikyow
The 79th JSAP Autumn Meeting, 2018   18 Sep 2018   
Takahiro Nagata, Shigenori Ueda, Asahiko Matsuda, Yoshiyuki Yamashita, Toyohiro Chikyow
International Conference on Nanoelectronics Strategy   14 May 2018   
Takahiro Nagata, Shigenori Ueda, Yoshiyuki Yamashita, Asahiko Matsuda, Toyohiro Chikyow
2017 International Workshop on Dielectric Thin Films for Future Electron Devices – Science and Technology – (IWDTF)   21 Nov 2017   
Asahiko Matsuda
IRC 20th Anniversary / Japanese Wikipedia 15th Anniversary Commemorative Workshop "Translating the World's Knowledge"   28 Oct 2017   Information Resources Center, Research Institute for Languages and Cultures of Asia and Africa, Tokyo University of Foreign Studies
J. Chbili, Z. Chbili, A. Matsuda, K. P. Cheung, J. T. Ryan, J. P. Campbell, M. Lahbabi
2017 IEEE International Integrated Reliability Workshop (IIRW)   10 Oct 2017   IEEE
Takahiro Nagata, Shigenori Ueda, Asahiko Matsuda, Yoshiyuki Yamashita, Toyohiro Chikyow
7th International Conference on Hard X-Ray Photoelectron Spectroscopy (HAXPES2017)   14 Sep 2017   
In Researching State-of-the-Art Devices [Invited]
Asahiko Matsuda
2nd Doctoral Course Alumni Meeting for Seniors and Graduate Students   14 Jul 2017   Kyoto University Department of Aeronautics and Astronautics
Dominic Gerlach, Asahiko Matsuda, Takahiro Nagata, Shigenori Ueda, Regan G. Wilks, Marcus Bär, Toyohiro Chikyow
16th International Conference on the Formation of Semiconductor Interfaces (ICFSI-16)   2 Jul 2017   
GaN plays a major role in the development of new devices, such as ultraviolet photodetectors, hydrogen sulfide gas sensors and next-generation power devices. However, the interaction of the chemical species and defect states at the metal/GaN inter...
Interface characterization of Schottky and Ohmic metal/GaN contacts
Dominic Gerlach, Asahiko Matsuda, Takahiro Nagata, Shigenori Ueda, Toyohiro Chikyow
MANA International Symposium 2017   28 Feb 2017   
Asahiko Matsuda
10th Plasma Electronics Incubation Hall   31 Aug 2016   JSAP Division of Plasma Electronics
Epitaxial grwoth of GaN on Si with buffers for future devioces
Toyohiro Chikyow, Nam Nguyen, Asahiko Matsuda, Tomoe Yayama, Takahiro Nagata, Yujin Cho, Takashi Sekiguchi, Kenjiro Uesugi, Shinya Nunoue, Noboru Fukushima, Takashi Teramoto, Christian Dussarrat, Takako Kimura
The 12th International Nanotechnology Conference on Communication and Cooperation (INC12)   May 2016   
Addressing the confusion regarding capture cross sections using charge pumping and reaction kinetics
Asahiko Matsuda, Jason T. Ryan, Jason P. Campbell, Kin P. Cheung
The 11th International Nanotechnology Conference on Communication and Cooperation   11 May 2015   
Asahiko Matsuda, Jason T. Ryan, Jason P. Campbell, Kin P. Cheung
2015 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)   27 Apr 2015   IEEE
Matsuda A, Nakakubo Y, Takao Y, Eriguchi K, Ono K.
ICICDT 2013 - International Conference on IC Design and Technology, Proceedings   2013   
Matsuda A, Nakakubo Y, Takao Y, Eriguchi K, Ono K
ICICDT 2013 - International Conference on IC Design and Technology, Proceedings   2013   
Si Substrate Damage During Plasma Processes and Optical Characterization Methodology [Invited]
Asahiko Matsuda
ICAN Kyou Sou Seminar   Mar 2012   Innovation Center for Advanced Nanodevices (ICAN), AIST
Eriguchi K, Nakakubo Y, Matsuda A, Kamei M, Takao Y, Ono K
ICICDT 2012 - IEEE International Conference on Integrated Circuit Design and Technology   2012   
Assessment of Ion-Bombardment Damage in Plasma-Exposed Si by Interface Layer Thickness and Charge-Trapping Defects
Asahiko Matsuda, Yoshinori Nakakubo, Masayuki Kamei, Yoshinori Takao, Koji Eriguchi, and Kouichi Ono
Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials   Oct 2009   
Effects of O2 addition on Si substrate surface damage exposed to Ar plasma
Yoshinori Nakakubo, Asahiko Matsuda, Yoshinori Takao, Koji Eriguchi, and Kouichi Ono
22nd Symposium on Plasma Science for Materials   15 Jun 2009   JSAP Division of Plasma Electronics
Modeling of Ion-Bombardment Damage on Si Surfaces for In-Line Analysis
Matsuda A, Nakakubo Y, Takao Y, Eriguchi K, Ono K
22nd Symposium on Plasma Science for Materials   15 Jun 2009   JSAP Division of Plasma Electronics
Asahiko Matsuda, Yoshinori Nakakubo, Riki Ogino, Hiroaki Ohta, Koji Eriguchi, and Kouichi Ono
Proceedings 2009 IEEE International Conference on Integrated Circuit Design and Technology   May 2009   
O2添加ArプラズマによるSi基板表面層内誘起欠陥の電気的解析
Nakakubo Y, Matsuda A, Ogino R, Ueda Y, Eriguchi K, Ono K
The 56th JSAP Spring Meeting   30 Mar 2009   
On the Importance of Interface Layer in Accurate Analysis of Plasma-Induced Damage on Si Surfaces
Matsuda A, Ogino R, Nakakubo Y, Ohta H, Eriguchi K, Ono K
The 56th JSAP Spring Meeting   30 Mar 2009   
Matsuda A, Ogino R, Nakakubo Y, Ohta H, Eriguchi K, Ono K
Plasma Science Symposium 2009/The 26th Symposium on Plasma Processing (PSS-2009/SPP-26)   2 Feb 2009   JSPS 153rd Committee on Plasma Materials Science
Eriguchi K, Matsuda A, Nakakubo Y, Kamei M, Ohta H, Ono K.
2009 IEEE International Conference on Integrated Circuit Design and Technology, ICICDT 2009   2009   
A new framework for performance prediction of advanced MOSFETs with plasma-induced recess structure and latent defect site
K Eriguchi, Y Nakakubo, A Matsuda, M Kamei, H Ohta, H Nakagawa, S Hayashi, S Noda, K Ishikawa, M Yoshimaru, K Ono
2008 IEEE International Electron Devices Meeting (IEDM)   15 Dec 2008   
Ar系プラズマにおけるSi表面層内誘起欠陥形成過程のO2添加効果
Nakakubo Y, Matsuda A, Ueda Y, Ohta Y, Eriguchi K, Ono K
69th JSAP Autumn Meeting   3 Sep 2008   
Nakakubo Y, Matsuda A, Kamei M, Ohta H, Eriguchi K, Ono K.
Proceedings - 2008 IEEE International Conference on Integrated Circuit Design and Technology, ICICDT   2 Jun 2008   

Research Grants & Projects

 
Japan Society for the Promotion of Science: Grant-in-Aid for JSPS Fellows
Project Year: Apr 2011 - Mar 2013    Investigator(s): Asahiko Matsuda

Education

 
Apr 2008
 - 
May 2013
Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University
 
Apr 2004
 - 
Mar 2008
Undergraduate School of Engineering Science, Faculty of Engineering, Kyoto University