MEMS structures and machines fabricated by photolithography and/or etching have often repeated unit microstructure. We need to design not only the global parameters but also microscopic and local parameters. In pursuit of this, a dynamic analysis of global/local problem is essential, and especially fast computational method and convenient modeling technique are both required for the MEMS design. Hence, this paper presents the application of model order reduction (MOR) for fast dynamic analysis combined with the finite element mesh superposition (FEMS) technique for practical and convenient modeling of the above-mentioned microstructures. Through two examples, the accuracy is carefully investigated for both global and local responses associated with the base vectors in MOR algorithm. The first example is analyzed by a kind of homogenization technique and MOR. The number of DOFs was finally reduced by a factor of approximately 1/6 (47,362/296,268). In addition, MOR enabled us to reduce the coefficient matrix size to only 300. The second example is analyzed by both FEMS and MOR, and it was found that MOR is also applicable to an unusual matrices generated by FEMS.