Butsurin Jinnai

Profile Information

Degree: Ph.D.(Mar, 2010, Tohoku University)

J-GLOBAL ID: 201801006539608980
researchmap Member ID: B000319587

Papers

Nanometer-thin L10-MnAl film with B2-CoAl underlayer for high-speed and high-density STT-MRAM: Structure and magnetic properties

Yutaro Takeuchi, Ryotaro Okuda, Junta Igarashi, Butsurin Jinnai, Takaharu Saino, Shoji Ikeda, Shunsuke Fukami, Hideo Ohno

Applied Physics Letters, 120(5), Jan 31, 2022
Temperature dependence of intrinsic critical current in perpendicular easy axis CoFeB/MgO magnetic tunnel junctions

Yutaro Takeuchi, Eli Christopher I. Enobio, Butsurin Jinnai, Hideo Sato, Shunsuke Fukami, Hideo Ohno

Applied Physics Letters, 119(24), Dec 13, 2021
Chiral-spin rotation of non-collinear antiferromagnet by spin-orbit torque

Yutaro Takeuchi, Yuta Yamane, Ju-Young Yoon, Ryuichi Itoh, Butsurin Jinnai, Shun Kanai, Jun'ichi Ieda, Shunsuke Fukami, Hideo Ohno

NATURE MATERIALS, 20(10) 1364-+, May, 2021
Fast Switching Down to 3.5 ns in Sub-5-nm Magnetic Tunnel Junctions Achieved by Engineering Relaxation Time

B. Jinnai, J. Igarashi, T. Shinoda, K. Watanabe, S. Fukami, H. Ohno

Technical Digest - International Electron Devices Meeting, IEDM, 2021-December 1-4, 2021
Nanosecond Random Telegraph Noise in In-Plane Magnetic Tunnel Junctions

Hayakawa, K., Kanai, S., Funatsu, T., Igarashi, J., Jinnai, B., Borders, W.A., Ohno, H., Fukami, S.

Physical Review Letters, 126(11), 2021 Peer-reviewed
Coherent magnetization reversal of a cylindrical nanomagnet in shape-anisotropy magnetic tunnel junctions

Jinnai, B., Igarashi, J., Watanabe, K., Enobio, E.C.I., Fukami, S., Ohno, H.

Applied Physics Letters, 118(8), 2021 Peer-reviewedLead authorCorresponding author
Temperature dependence of the energy barrier in X/1X nm shape-anisotropy magnetic tunnel junctions

Igarashi, J., Jinnai, B., Desbuis, V., Mangin, S., Fukami, S., Ohno, H.

Applied Physics Letters, 118(1), 2021 Peer-reviewedLead authorCorresponding author
High-performance shape-anisotropy magnetic tunnel junctions down to 2.3 nm

B. Jinnai, J. Igarashi, K. Watanabe, T. Funatsu, H. Sato, S. Fukami, H. Ohno

Technical Digest - International Electron Devices Meeting, IEDM, 2020-December 24.6.1-24.6.4, Dec 12, 2020 Peer-reviewedLead authorCorresponding author
Scaling magnetic tunnel junction down to single-digit nanometers - Challenges and prospects

Jinnai, B., Watanabe, K., Fukami, S., Ohno, H.

Applied Physics Letters, 116(16) 160501-160501, 2020 Peer-reviewedInvitedLead authorCorresponding author
Write-error rate of nanoscale magnetic tunnel junctions in the precessional regime

Saino, T., Kanai, S., Shinozaki, M., Jinnai, B., Sato, H., Fukami, S., Ohno, H.

Applied Physics Letters, 115(14), 2019 Peer-reviewed
Spin-orbit torque-induced switching of in-plane magnetized elliptic nanodot arrays with various easy-axis directions measured by differential planar Hall resistance

Takahashi, Y., Takeuchi, Y., Zhang, C., Jinnai, B., Fukami, S., Ohno, H.

Applied Physics Letters, 114(1) 012410, 2019 Peer-reviewed
Shape anisotropy revisited in single-digit nanometer magnetic tunnel junctions

Watanabe, K., Jinnai, B., Fukami, S., Sato, H., Ohno, H.

Nature Communications, 9(1), 2018 Peer-reviewed
Scalability and wide temperature range operation of spin-orbit torque switching devices using Co/Pt multilayer nanowires

Jinnai, B., Sato, H., Fukami, S., Ohno, H.

Applied Physics Letters, 113(21) 212403, 2018 Peer-reviewedLead authorCorresponding author
Spin-orbit torque induced magnetization switching in Co/Pt multilayers

Jinnai, B., Zhang, C., Kurenkov, A., Bersweiler, M., Sato, H., Fukami, S., Ohno, H.

Applied Physics Letters, 111(10), 2017 Peer-reviewedLead authorCorresponding author
Measurement and simulation of spreading current in interlayer dielectric film deposition by plasma-enhanced chemical vapor deposition

Matsunaga, N., Okumura, H., Jinnai, B., Samukawa, S.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 29(4), 2011 Peer-reviewed
Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique

Jinnai, B., Fukuda, S., Ohtake, H., Samukawa, S.

Journal of Applied Physics, 107(4), 2010 Peer-reviewed
Hard-mask-through UV-light-induced damage to low-k film during plasma process for dual damascene

Matsunaga, N., Okumura, H., Jinnai, B., Samukawa, S.

Japanese Journal of Applied Physics, 49(4 PART 2), 2010 Peer-reviewed
Prediction of abnormal etching profile in high-aspect-ratio via/hole etching using on-wafer monitoring system

Ohtake, H., Fukuda, S., Jinnai, B., Tatsumi, T., Samukawa, S.

Japanese Journal of Applied Physics, 49(4 PART 2), 2010 Peer-reviewed
Decisive factors affecting plasma resistance and roughness formation in ArF photoresist

Jinnai, B., Uesugi, T., Koyama, K., Kato, K., Yasuda, A., Maeda, S., Momose, H., Samukawa, S.

Journal of Physics D: Applied Physics, 43(39), 2010 Peer-reviewed
Improving plasma resistance and lowering roughness in an ArF photoresist by adding a chemical reaction inhibitor

Jinnai, B., Uesugi, T., Koyama, K., Kato, K., Yasuda, A., Maeda, S., Momose, H., Samukawa, S.

Journal of Physics D: Applied Physics, 43(46), 2010 Peer-reviewed

Industrial Property Rights

特許US9899227 System, method and apparatus for ion milling in a plasma etch chamber

Joydeep Guha, Butsurin Jinnai, Jun Hee Han, Aaron Eppler
特許US8784676 Waferless Auto Conditioning

Joydeep Guha, Sanket Sant, Butsurin Jinnai
特開US20130270227 A1 Layer-layer etch of non volatile materials

Joydeep Guha, Jeffrey Marks, Butsurin Jinnai

Misc.

極微細高性能磁気トンネル接合素子の開発と5G/6G時代への展望

陣内佛霖, 五十嵐純太, 渡部杏太, 深見俊輔, 大野英男

セラミックス, 56(6) 418-422, Jun, 2021 InvitedLead authorCorresponding author

Research Projects

極微細スピントロニクスデバイスにおける微細構造表面の磁気特性評価とその制御

科学研究費助成事業基盤研究(C), 基盤研究(C), 日本学術振興会, Apr, 2019 - Mar, 2022

陣内佛霖
プラズマエッチングプロセス表面反応解析に関する研究

科学研究費助成事業特別研究員奨励費, 特別研究員奨励費, 日本学術振興会, 2009 - 2010

陣内佛霖

Profile Information

Papers

Industrial Property Rights

Misc.

Research Projects

Menu

Coauthors