論文

査読有り
2003年9月

Relaxation processes of photoexcited carriers in GaAs/AlAs multiple quantum well structures grown by molecular beam epitaxy at low temperatures

JOURNAL OF APPLIED PHYSICS
  • MC Rath
  • ,
  • T Araya
  • ,
  • S Kumazaki
  • ,
  • K Yoshihara
  • ,
  • N Otsuka

94
5
開始ページ
3173
終了ページ
3180
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1063/1.1595142
出版者・発行元
AMER INST PHYSICS

The relaxation processes of photoexcited carriers in GaAs/AlAs multiple quantum well structures grown at low temperatures by molecular beam epitaxy were studied by a tunable single-beam femtosecond pump-probe method. Concentrations of singularly ionized antisite arsenic ions, As-Ga(+), in the quantum wells, which were considered as traps of photoexcited carriers, were estimated from flux conditions and substrate temperatures in the growth. Transient transmittivity of the structures were measured by varying the pump-probe photon energy. The trapping rate of photoexcited carriers, which corresponded to the reciprocal of the carrier lifetime, was derived from the relaxation profile at the pump-probe photon energy close to the exciton resonant excitation energy for each structure. The trapping rate was found to increase linearly with As-Ga(+) in a lower concentration range and superlinearly in a higher concentration range. Photoluminescence and absorption spectra were observed at room temperature and their correlation to the carrier lifetimes were investigated. (C) 2003 American Institute of Physics.

リンク情報
DOI
https://doi.org/10.1063/1.1595142
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000184844200055&DestApp=WOS_CPL
ID情報
  • DOI : 10.1063/1.1595142
  • ISSN : 0021-8979
  • Web of Science ID : WOS:000184844200055

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