Daisuke Ohori

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Daisuke Ohori

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Daisuke Ohori, Takuya Fujii, Shuichi Noda, Wataru Mizubayashi, Kazuhiko Endo, Kazuhiko Endo, En Tzu Lee, Yiming Li, Yiming Li, Yao Jen Lee, Takuya Ozaki, Seiji Samukawa, Seiji Samukawa, Seiji Samukawa, Seiji Samukawa, Seiji Samukawa
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films   37    Mar 2019
© 2019 Author(s). In case of using pure chlorine chemistry, Ge etching reactivity is three times higher than Si etching reactivity because of the larger lattice spacing in Ge. As a result, during the chlorine plasma etching of a Ge Fin structure, ...
Takuya Fujii, Daisuke Ohori, Shuichi Noda, Yosuke Tanimoto, Daisuke Sato, Hideyuki Kurihara, Wataru Mizubayashi, Kazuhiko Endo, Yiming Li, Yao Jen Lee, Takuya Ozaki, Seiji Samukawa
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films   37    Sep 2019
© 2019 Author(s). The authors developed extremely selective etching for making an atomically flat, defect-free germanium fin (Ge Fin) structure. The etching uses a hydrogen bromide (HBr) neutral beam (NB), and they investigated the etching reactio...
大堀大介, 寒川誠二, 寒川誠二
応用物理学会秋季学術講演会講演予稿集(CD-ROM)   79th ROMBUNNO.18p‐431B‐9   Sep 2018
大堀大介, 久保山瑛哲, 山本淳, 村田正行, 遠藤和彦, 遠藤和彦, 寒川誠二, 寒川誠二, 寒川誠二
応用物理学会秋季学術講演会講演予稿集(CD-ROM)   79th ROMBUNNO.20p‐211A‐13   Sep 2018
松田真輝, 大堀大介, 寒川誠二, 寒川誠二, 碇哲雄, 福山敦彦
応用物理学会秋季学術講演会講演予稿集(CD-ROM)   79th ROMBUNNO.21p‐PB4‐2   Sep 2018