2012年11月
Fabrication of nanodot array mold with 2 Tdot/in.(2) for nanoimprint using metallic glass
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
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- 巻
- 30
- 号
- 6
- 開始ページ
- 061602
- 終了ページ
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1116/1.4761472
- 出版者・発行元
- A V S AMER INST PHYSICS
Here, the authors fabricated a mold consisting of nanodot arrays with an 18-nm pitch and performed nanoimprinting of metallic glass for developing bitpatterned media (BPM) with an areal recording density of 2 Tbit/in.(2). Specifically, they investigated the feasibility of SiO2/Si mold fabrication by metal mask patterning with focused ion beam assisted chemical vapor deposition (FIB-CVD) and reactive ion etching (RIE). SiO2 was etched with a mixed gas of CHF3 and O-2, resulting in successful fabrication of convex nanodot arrays with an 18-nm pitch. The authors attempted nanoimprinting of Pd-based metallic glass with the fabricated SiO2 mold and clearly confirmed the replication of the fine nanohole pattern. These results suggest that the proposed FIB-CVD and RIE process is a promising method for fabricating ultrafine nanodot arrays and that metallic glasses are excellent nanoimprintable materials for mass-produced nanodevices such as BPM with ultrahigh recording density. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4761472]
- リンク情報
- ID情報
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- DOI : 10.1116/1.4761472
- ISSN : 1071-1023
- Web of Science ID : WOS:000311667300093