奥村治樹 (Haruki Okumura) - マイポータル

基本情報

所属: ジャパン・リサーチ・ラボ代表
: 大阪産業大学非常勤講師

学位: 博士（工学）(広島大学)

J-GLOBAL ID: 200901090270386030
researchmap会員ID: 5000071806

外部リンク

研究キーワード

研究分野

経歴

学歴

- 2004年

広島大学
- 1993年

京都工芸繊維大学

委員歴

受賞

1999年

Poster Award of International Symposium on Two-Dimensional Correlation Spectroscopy

論文

Development of high performance multi-layer process with H2 plasma hardening

Takeo Ishibashi, Yoshiharu Ono, Atsumi Yamaguchi, Tetsuro Hanawa, Masahiro Tadokoro, Kazunori Yoshikawa, Kazumasa Yonekura, Haruki Okumura, Tsuyoshi Matsunobe, Yasushi Fujii …

Polymer Preprints, Japan 55(2) 3262-3263 2006年
Depth Profile Analysis of Chemically Amplified Resist by Using TOF-SIMS with Gradient Shaving Preparations

奥村治樹

Appl. Surf. Sci. 2006年査読有り
Depth profile analysis of plasma-cured multi layer resist

Haruki Okumura, Takeshi Matsunobe, Keiko Matsuda, Yoshiharu Ono, Takeo Ishibashi, Tetsuro Hanawa, Masahiro Tadokoro, Kazunori Yoshikawa, Kazumasa Yonekura, Yasushi Fujii …

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 19(3) 379-384 2006年査読有り
Depth Profile Analysis of Structures in ArF Resist by 172 nm VUV Curing and Dry-etching Process Using μ-FT-IR with Gradient Shaving Preparation.

J.Photopolym.Sci.Tech. 17(4) 535-540 2004年査読有り
Depth profile analysis of polyimide film treated by potassium hydroxide

H Okumura, T Takahagi, N Nagai, S Shingubara

JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS 41(17) 2071-2078 2003年9月査読有り
Depth profile analysis of the photochemical degradation of polycarbonate by infrared spectroscopy

N Nagai, H Okumura, T Imai, Nishiyama, I

POLYMER DEGRADATION AND STABILITY 81(3) 491-496 2003年9月査読有り
Improvement in 193 nm photoresists performance by 172 nm VUV curing

K Takeda, H Asahara, T Hanawa, K Tsujita, H Okumura, N Hishinuma

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 16(4) 511-516 2003年査読有り
Depth profile analysis of ion-implanted photoresist by infrared spectroscopy

N Nagai, T Imai, K Terada, H Seki, H Okumura, H Fujino, T Yamamoto, Nishiyama, I, A Hatta

SURFACE AND INTERFACE ANALYSIS 33(7) 545-551 2002年7月査読有り
Study on temperature calibration of a silicon substrate in a temperature programmed desorption analysis

N Hirashita, T Jimbo, T Matsunaga, M Matsuura, M Morita, Nishiyama, I, M Nishizuka, H Okumura, A Shimazaki, N Yabumoto

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 19(4) 1255-1260 2001年7月査読有り
Application of two-dimensional correlation method to the evolved gas analysis I: Thermal desorption spectroscopy

H Okumura, M Sonoyama, K Okuno, Y Nagasawa, H Ishida

TWO-DIMENSIONAL CORRELATION SPECTROSCOPY 503 232-236 2000年査読有り
ESCA Study on Depth Profiling of Cellulose/Poly (vinyl alcohol) Blend Films

Haruki Okumura, Mitsuhiro Shibayama, Hiroyuki Koshizaki, Shinichi Sakurai, Shunji Nomura

Sen'i Gakkaishi 49(9) 466-473 1993年査読有り