1994年2月
Surface and interface properties of epitaxial Fe<inf>3</inf>O<inf>4</inf> films studied by Mössbauer spectroscopy
Journal of Magnetism and Magnetic Materials
- ,
- ,
- ,
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- 巻
- 130
- 号
- 1-3
- 開始ページ
- 267
- 終了ページ
- 274
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1016/0304-8853(94)90683-1
Stoichiometric Fe O films have formed epitaxially on α-Al O and MgO single-crystal substrates by a reactive vapor deposition method. In order to apply conversion electron Mössbauer spectroscopy depth-selectively, a 5-7 Åthick probe layer containing Fe was formed at various depths in inactive Fe O matrix films. At the topmost surfaces and also at the interfaces, the essential electronic features of bulk Fe O are retained, including a rapid electron hopping between the Fe and Fe ions at B sites. Minor depth-dependent changes are confined to a few outermost atomic layers, and the changes depend on the orientation and the lattice mismatch with the substrate. For (111) growth on α-Al O , the surface layer seems to be strongly relaxed to reduced the electric polarization, while a high density of defects seems to be concentrated at the interface with α-Al O . For (001) growth on MgO, the surface retains the spinel lattice though slightly oxidized, while the interface with MgO has good crystallinity and stoichiometry. An enhanced thermal fluctuation of the Fe -spins in contact with the MgO substrate and in the topmost surface layer can be seen in their reduced magnetic hyperfine field at 300 K. © 1994. 3 4 2 3 3 4 3 4 2 3 2 3 57 56 2+ 3+ 3+
- リンク情報
- ID情報
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- DOI : 10.1016/0304-8853(94)90683-1
- ISSN : 0304-8853
- SCOPUS ID : 0028380892