MISC

招待有り 筆頭著者
2018年12月5日

Recent Progress in GaN Device Technology

2018 14th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2018 - Proceedings
  • Nobuyuki Otsuka
  • ,
  • Yuji Kudoh
  • ,
  • Hiroaki Ueno
  • ,
  • Asamira Suzuki

開始ページ
662
終了ページ
665
記述言語
英語
掲載種別
DOI
10.1109/ICSICT.2018.8564898
出版者・発行元
IEEE

© 2018 IEEE. Several new technologies for GaN high frequency devices and GaN power devices are reviewed. Newly developed GaN devices have a superior performance over conventional Si-based ones in view of lowering the energy loss and reducing the system size. Normally-off GaN HFETs are demonstrated.

リンク情報
DOI
https://doi.org/10.1109/ICSICT.2018.8564898
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000458919700194&DestApp=WOS_CPL
Scopus
https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85060291340&origin=inward
Scopus Citedby
https://www.scopus.com/inward/citedby.uri?partnerID=HzOxMe3b&scp=85060291340&origin=inward
ID情報
  • DOI : 10.1109/ICSICT.2018.8564898
  • SCOPUS ID : 85060291340
  • Web of Science ID : WOS:000458919700194

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