Papers

Peer-reviewed
2015

Suppression of byproduct generation at 4H-SiC/SiO2 interface by the control of oxidation conditions characterized by infrared spectroscopy

Applied Physics Express
  • Hirai, Hirohisa
    • ,
  • Kita, Koji
Volume
8
Number
2
Language
Publishing type
Research paper (scientific journal)
DOI
10.7567/APEX.8.021401
Link information
DOI
https://doi.org/10.7567/APEX.8.021401
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000350091400007&DestApp=WOS_CPL
ID information
  • DOI : 10.7567/APEX.8.021401
  • ORCID - Put Code : 45785853
  • Web of Science ID : WOS:000350091400007
Export
BibTeX RIS
To Papers list