論文

査読有り
2016年7月

Association between Medication Adherence and Duration of Outpatient Treatment in Patients with Schizophrenia

PSYCHIATRY INVESTIGATION
  • Seiichiro Tarutani
  • ,
  • Hiroki Kikuyama
  • ,
  • Munehiro Ohta
  • ,
  • Tetsufumi Kanazawa
  • ,
  • Takehiko Okamura
  • ,
  • Hiroshi Yoneda

13
4
開始ページ
413
終了ページ
419
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.4306/pi.2016.13.4.413
出版者・発行元
KOREAN NEUROPSYCHIATRIC ASSOC

Objective Medication adherence is important in the treatment of schizophrenia, and critical periods during treatment may be associated with relapse. However, the relationship between adherence and duration of outpatient treatment (DOT) remains unclear. The authors aimed to clarify the relationship between adherence and DOT at a psychiatric hospital in Japan.
Methods For outpatients with schizophrenia who regularly visit Shin-Abuyama hospital, the authors conducted a single questionnaire survey (five questions covering gender, age, DOT, medication shortages, and residual medication) over one month period. Participants were divided into two groups whether DOT were from more than one year to within five years or not. Mantel-Haenszel analysis and logistic regression analysis were performed on the data regarding the medication adherence.
Results Effective answers were received for 328 patients. The residual medication rate was significantly higher among those receiving outpatient treatment from more than one year to within five years than five years than those receiving outpatient treatment for more than five years or less than one year (p=0.016).
Conclusion This survey suggests that there are critical periods during which patients are most prone to poor adherence. Because poor adherence increases the risk of relapse, specific measures must be taken to improve adherence during these periods.

リンク情報
DOI
https://doi.org/10.4306/pi.2016.13.4.413
J-GLOBAL
https://jglobal.jst.go.jp/detail?JGLOBAL_ID=201702211348841420
PubMed
https://www.ncbi.nlm.nih.gov/pubmed/27482242
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000380733300006&DestApp=WOS_CPL
ID情報
  • DOI : 10.4306/pi.2016.13.4.413
  • ISSN : 1738-3684
  • eISSN : 1976-3026
  • J-Global ID : 201702211348841420
  • PubMed ID : 27482242
  • Web of Science ID : WOS:000380733300006

エクスポート
BibTeX RIS