論文

査読有り
2020年6月

Formation of smooth Au surfaces produced by multiple thin-film transfer process based on template stripping for low-temperature bonding

Proceedings - Electronic Components and Technology Conference
  • Eiji Higurashi
  • ,
  • Michitaka Yamamoto
  • ,
  • Ryutaro Nishimura
  • ,
  • Takashi Matsumae
  • ,
  • Yuichi Kurashima
  • ,
  • Hideki Takagi
  • ,
  • Tadatomo Suga
  • ,
  • Toshihiro Itoh

2020-June
開始ページ
223
終了ページ
228
記述言語
英語
掲載種別
研究論文(国際会議プロシーディングス)
DOI
10.1109/ECTC32862.2020.00047
出版者・発行元
IEEE COMPUTER SOC

Surface roughness plays a crucial role in the low temperature solid-state bonding. Here, we present a multiple thinfilm transfer method for the fabrication of smooth Au surfaces. The multiple thin-film transfer procedure uses a template stripping, which mechanically peeling-off the Au thin films prepared on a smooth template, and the simultaneous lowtemperature direct bonding process to target rough surfaces. By repeating this transfer process, rms surface roughness of rough Au surfaces decreased from 205 nm to 10 nm over a large area (90 × 90 μm2) and from 3.1 nm to 0.8 nm over a small area (1 × 1 μm2), respectively. Au-Au surface activated bonding of rough surface finished Si substrates with or without template stripped Au thin films was performed at a low temperature (150 °C). Strong bonds between the Au/Au were formed in the case of multiple thin-film transfer process, although bonding didn't succeed without template stripped Au.

リンク情報
DOI
https://doi.org/10.1109/ECTC32862.2020.00047
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000620983200035&DestApp=WOS_CPL
Scopus
https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85090298657&origin=inward
Scopus Citedby
https://www.scopus.com/inward/citedby.uri?partnerID=HzOxMe3b&scp=85090298657&origin=inward
ID情報
  • DOI : 10.1109/ECTC32862.2020.00047
  • ISSN : 0569-5503
  • eISSN : 2377-5726
  • ISBN : 9781728161808
  • SCOPUS ID : 85090298657
  • Web of Science ID : WOS:000620983200035

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