2005年2月
Significant magnetoresistance enhancement due to a cotunneling process in a double tunnel junction with single discontinuous ferromagnetic layer insertion
PHYSICAL REVIEW LETTERS
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- 巻
- 94
- 号
- 6
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1103/PhysRevLett.94.068304
- 出版者・発行元
- AMERICAN PHYSICAL SOC
We fabricate CoFe/AlOx/CoFe/AlOx/CoFe ferromagnetic double tunnel junctions and observe spindependent tunneling phenomena. A middle CoFe layer becomes discontinuous by forming CoFe particles two dimensionally, of which the average diameter is evaluated to be 2.0-4.5 nm from cross-sectional transmission electron microscopy images. Below 50 K, a Coulomb gap is observed in current-voltage curves, and both magnetoresistance ratios and resistances are found to increase significantly with decreasing temperature. This indicates that a cotunneling process is dominant within the gap, which agrees very well with theoretical prediction [Phys. Rev. Lett. 80, 1758 (1998)].
- リンク情報
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- DOI
- https://doi.org/10.1103/PhysRevLett.94.068304
- Web of Science
- https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000227140400075&DestApp=WOS_CPL
- URL
- https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=18144403516&origin=inward
- ID情報
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- DOI : 10.1103/PhysRevLett.94.068304
- ISSN : 0031-9007
- SCOPUS ID : 18144403516
- Web of Science ID : WOS:000227140400075