2018年12月
Photothermally Assisted Thinning of Silicon Nitride Membranes for Ultrathin Asymmetric Nanopores
ACS NANO
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- 巻
- 12
- 号
- 12
- 開始ページ
- 12472
- 終了ページ
- 12481
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1021/acsnano.8b06805
- 出版者・発行元
- AMER CHEMICAL SOC
Sculpting solid-state materials at the nanoscale is an important step in the manufacturing of numerous types of sensor devices, in particular solid-state nanopore sensors. Here we present mechanistic insight into laser-induced thinning of low-stress silicon nitride (SiNx) membranes and films. In a recent study, we observed that focusing a visible wavelength laser beam on a SiNx membrane results in efficient localized heating, and we used this effect to control temperature at a solid-state nanopore sensor. A side-effect of the observed heating was that the pores expand/degrade under prolonged high power illumination, prompting us to study the mechanism of this etching process. We find that SiNx can be etched under exposure to light of similar to 10(7) W/cm(2) average intensity, with etch rates that are influenced by the supporting electrolyte. Combining this controlled etching with dielectric breakdown, an electrokinetic process for making pores, nanopores of arbitrary dimensions as small as 1-2 nm in diameter and thickness can easily be fabricated. Evidence gathered from biomolecule-pore interactions suggests that the pore geometries obtained using this method are more funnel-like, rather than hourglass-shaped. Refined control over pore dimensions can expand the range of applications of solid-state nanopores, for example, biopolymer sequencing and detection of specific biomarkers.
- リンク情報
- ID情報
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- DOI : 10.1021/acsnano.8b06805
- ISSN : 1936-0851
- eISSN : 1936-086X
- Web of Science ID : WOS:000454567500070