論文

2022年6月10日

Quantitative analysis of oxygen in solution in the Ti-Al-O ternary alloys by soft X-ray emission spectroscopy

Journal of Alloys and Compounds
  • Hirotoyo Nakashima
  • ,
  • Arata Kinouchi
  • ,
  • Masao Takeyama

920
開始ページ
165822
終了ページ
165822
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/j.jallcom.2022.165822
出版者・発行元
Elsevier {BV}

Soft X-ray emission spectroscopy (SXES) technique combined with an electron probe micro analyzer is used to study the oxygen concentrations of the alpha-Ti and gamma-TiAl phases in equilibrium with each other in the Ti-Al-O ternary system. A series of alloys with various oxygen concentrations were prepared for standard and quantitative analysis. In order to optimize the analysis condition, the oxygen-K alpha peak intensities were measured under various probe currents, acceleration voltages, and dwell times for homogenized alpha single-phase samples with known oxygen concentrations after removing the oxygen-enriched layer on the surface by Ar sputtering. The calibration curve obtained under the optimized conditions shows excellent sensitivity to dissolved oxygen concentration as well as high linearity and an accuracy of better than 0.01 wt%. The combination of oxygen analysis using SXES and metal element analysis by wavelength dispersive spectroscopy revealed that the oxygen is enriched in the alpha phase and the Al concentration of the alpha phase in equilibrium with the gamma phase decreases. In the meantime, the gamma phase can dissolve only about 0.2 at% oxygen, and the alpha + gamma/gamma phase boundary moves significantly toward higher Al concentration with increasing oxygen in the alloy. These results suggest that interstitial oxygen prefers the Ti-O bonds in close-packed structures and can hardly have the Al-O bonds. (C) 2022 Elsevier B.V. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/j.jallcom.2022.165822
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000832992700001&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.jallcom.2022.165822
  • ISSN : 0925-8388
  • eISSN : 1873-4669
  • ORCIDのPut Code : 114475079
  • Web of Science ID : WOS:000832992700001

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