論文

2008年11月

Effects of Oxygen Annealing on Dielectric Properties of LuFeCuO4

JAPANESE JOURNAL OF APPLIED PHYSICS
  • Yoji Matsuo
  • ,
  • Muneyasu Suzuki
  • ,
  • Yuji Noguchi
  • ,
  • Takeshi Yoshimura
  • ,
  • Norifumi Fujimura
  • ,
  • Kenji Yoshi
  • ,
  • Naoshi Ikeda
  • ,
  • Shigeo Mori

47
11
開始ページ
8464
終了ページ
8467
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1143/JJAP.47.8464
出版者・発行元
JAPAN SOC APPLIED PHYSICS

We investigated the effect of oxygen annealing on dielectric properties of LuFeCuO4 mainly by dielectric measurements and transmission electron microscopy experiments. It was found that the leakage current density decreases with high-pressure oxygen annealing and the size of nanodomains with orientational polarization increases, which is characterized by the short-range ordering of Fe3+ and Cu2+ ions on a triangular lattice. In addition, the absolute value of relative permittivity epsilon ' decreases with oxygen annealing and epsilon ' exhibits a broad peak in the temperature window between room temperature and 550 K, which is similar to that observed in relaxor ferroelectric materials. The present experimental results suggest that the number of oxygen vacancics has a crucial effect on dielectric properties of LuFeCuO4. [DOI: 10.1143/JJAP.47.8464]

リンク情報
DOI
https://doi.org/10.1143/JJAP.47.8464
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000261311400048&DestApp=WOS_CPL
ID情報
  • DOI : 10.1143/JJAP.47.8464
  • ISSN : 0021-4922
  • Web of Science ID : WOS:000261311400048

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