2011年9月
The effects of cluster size on sputtering and surface smoothing of PMMA with gas cluster ion beams
Transactions of the Materials Research Society of Japan
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- 巻
- 36
- 号
- 3
- 開始ページ
- 309
- 終了ページ
- 312
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.14723/tmrsj.36.309
- 出版者・発行元
- The Materials Research Society of Japan
We investigated the sputtering rate and surface morphology of polymethylmethacrylate (PMMA) samples bombarded with Ar cluster ion beam with selected energy of 12.5 eV/atom. The incident cluster energy range was 10–60 keV/ion. The incident cluster ion was selected before irradiation by using the time-of-flight (TOF) method. Both the sputtering rates and the average surface roughness increased rapidly with increasing incident cluster size under bombardment with small cluster ion. Under bombardment with large cluster ion, the average surface roughness does not increase rapidly, although sputtering rates increased nonlinearly. It suggests that a cluster ion beam with large size would be effective for high speed etching without roughing the surface.
- リンク情報
- ID情報
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- DOI : 10.14723/tmrsj.36.309
- ISSN : 1382-3469
- CiNii Articles ID : 130003398961