論文

査読有り
1996年

Atomic level smoothing of CVD diamond films by gas cluster ion beam etching

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
  • Akihisa Yoshida
  • ,
  • Masahiro Deguchi
  • ,
  • Makoto Kitabatake
  • ,
  • Takashi Hirao
  • ,
  • Jiro Matsuo
  • ,
  • Noriaki Toyoda
  • ,
  • Isao Yamada

112
1-4
開始ページ
248
終了ページ
251
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/0168-583X(95)01007-6
出版者・発行元
Elsevier

Chemical vapor deposited diamond films on silicon substrates were etched by a gas cluster ion beam. We found that a gas cluster ion beam of 1017 ions/cm2 would be effective to smooth the surface of the CVD diamond films. It was confirmed that atomic level smooth surfaces (Ra = 1.9 nm by AFM measurements) were formed by Ar gas cluster ion beam (Ar+ 3000) etching. We believe that the gas cluster ion beam etching technique will be a key technology for diamond device fabrication.

リンク情報
DOI
https://doi.org/10.1016/0168-583X(95)01007-6
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:A1996UW20100051&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/0168-583X(95)01007-6
  • ISSN : 0168-583X
  • SCOPUS ID : 0030563228
  • Web of Science ID : WOS:A1996UW20100051

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