論文

査読有り
2006年7月

High-intensity Si cluster ion emission from a silicon target bombarded with large Ar cluster ions

APPLIED SURFACE SCIENCE
  • Satoshi Ninomiya
  • ,
  • Takaaki Aoki
  • ,
  • Toshio Seki
  • ,
  • Jiro Matsuo

252
19
開始ページ
6550
終了ページ
6553
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/j.apsusc.2006.02.100
出版者・発行元
ELSEVIER SCIENCE BV

Secondary ions emitted from Si targets were measured with a quadrupole mass spectrometer under large Ar cluster and monomer ion bombardment. Incident ion beams with energies from 7.5 to 25 keV were used and the mean size of the Ar cluster ion was about 1000 atoms/cluster. Si-n(+) ions with n values up to n = 8 were detected under Ar cluster ion bombardment, whereas Si cluster ions were scarcely detected under Ar monomer ion bombardment. These cluster ion yields showed the power law dependence on the cluster size. (c) 2006 Published by Elsevier B.V.

リンク情報
DOI
https://doi.org/10.1016/j.apsusc.2006.02.100
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000240609900039&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.apsusc.2006.02.100
  • ISSN : 0169-4332
  • Web of Science ID : WOS:000240609900039

エクスポート
BibTeX RIS