北嶋 武

Plasmonic nitriding of graphene on a graphite substrate via gold nanoparticles and NH3/Ar plasma 

Journal of Vacuum Science & Technology A 2020年12月  

Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma 

Journal of Physics Communications 4(9) 095013-095013 2020年9月12日  

Morphology influence in rapid plasma nitriding of hafnium layer for HfSiON film growth 

Journal of Vacuum Science & Technology A 2019年12月  

Titanium coverage for plasma-induced uniform HfSiON film from Hf nanoscale islands on SiO2/Si 

Journal of Vacuum Science & Technology A 2018年11月  

Nitrogen plasma-induced HfSiON film growth from Hf nanoscale islands on SiO2/Si 

Journal of Vacuum Science & Technology A 2018年9月  

Observation of the adsorption and desorption kinetics of weakly bound CO on Si(001)-c(4×2) by means of scanning tunneling microscopy 

Surface Science 2014年9月  

Molecular Motion Induced by Multivibronic Excitation on Semiconductor Surface 

The Journal of Physical Chemistry C 2014年1月23日  

Optical Diagnostics of Breakdown Phase of Pulsed N$_{2}$/He Atmospheric-Pressure Microhollow Cathode Discharge Plasma 

Japanese Journal of Applied Physics 2011年8月22日  

Contribution in Semiconductor Industry of Surface Science 

Hyomen Kagaku 2011年  

Increased O(D1) metastable flux with Ar and Kr diluted oxygen plasmas and improved film properties of grown SiO2 film 

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2008年9月  

Diagnostics of N-2 dissociation in RF plasmas by vacuum ultraviolet emission and absorption spectroscopy 

PLASMA SOURCES SCIENCE & TECHNOLOGY 17(2) 2008年5月  査読有り

Diagnostics of N2dissociation in RF plasmas by vacuum ultraviolet emission and absorption spectroscopy 

Plasma Sources Science and Technology 2008年5月1日  

Diagnostics for low-energy electrons in a two-frequency capacitively coupled plasma in Ar 

Applied Physics Letters 2008年2月18日  

Oxygen atom density in rare gas diluted O2 radio frequency plasma 

Thin Solid Films 2006年5月  

Time-Resolved Measurement of Charging on Hole Bottoms of SiO2Wafer Exposed to Plasma Etching in a Pulsed Two-Frequency Capacitively Coupled Plasma 

Japanese Journal of Applied Physics 2005年8月19日