古澤孝弘 (TAKAHIRO KOZAWA) - マイポータル

基本情報

342

Dissolution kinetics of main-chain-scission-type resist in organic developers

Ayako Nakajima, Keiko Matsuo, Takahiro Kozawa

Applied Physics Express 14(2) 026501 - 026501 2021年1月8日査読有り
Gel permeation chromatography analysis of remaining components of electron-beam-irradiated ZEP520A resist after development

Ayako Nakajima, Manabu Hoshino, Takahiro Kozawa

Japanese Journal of Applied Physics 60(1) 010901 - 010901 2021年1月1日査読有り
Changes in molecular weight distribution caused by main-chain scission of electron beam resists

Takahiro Kozawa, Ayako Nakajima, Manabu Hoshino

Japanese Journal of Applied Physics 59(12) 126506 - 126506 2020年12月3日査読有り
Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes

Kazuki Azumagawa, Takahiro Kozawa

Japanese Journal of Applied Physics 59 116505 2020年11月査読有り
Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

Yuta Ikari, Kazumasa Okamoto, Akihiro Konda, Takahiro Kozawa, Takao Tamura

Japanese Journal of Applied Physics 59(8) 086506 - 086506 2020年8月1日査読有り

フォトポリマー懇話会ニュースレター

古澤孝弘

92 1 - 3 2020年10月
Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Laser Lithography System (vol 31, pg 221, 2018)

Hiroto Kudo, Shizuya Ohori, Hiroya Takeda, Hiroki Ogawa, Takeo Watanabe, Hiroki Yamamoto, Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 31(6) 759 - 759 2018年
Dynamics of Radical Ions of Fluorinated Polymer for Extreme Ultraviolet (EUV) Lithography

Naoya Nomura, Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki

PHOTOMASK JAPAN 2015: PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XXII 9658 2015年
Deprotonation mechanism of ionized poly(4-hydroxystyrene)

Toshihiko Susa, Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo. Umegaki

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXI 9051 2014年
Fluidity dependence of deprotonation kinetics of chemically amplified resist

Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo. Umegaki

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXI 9051 2014年