古澤孝弘 (TAKAHIRO KOZAWA) - 論文

Dissolution dynamics of poly(4-hydroxystyrene) in potassium hydroxide (KOH) and sodium hydroxide (NaOH) aqueous solutions investigated by quartz crystal microbalance (QCM) method

Yuko Tsutsui Ito, Kyoko Watanabe, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics 63(4) 046502-046502 2024年4月9日査読有り責任著者

Dissolution dynamics of zirconia nanocluster resist

Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics 63(4) 046501-046501 2024年4月8日査読有り責任著者

Dissolution dynamics of poly(4-hydroxystyrene-co-methacrylic acid) in tetraalkylammonium hydroxide aqueous solutions

Yutaro Iwashige, Kyoko Watanabe, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics 63(2) 026504-026504 2024年2月21日査読有り責任著者

Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking

Bilal A. Naqvi, Satoshi Enomoto, Kohei Machida, Yui Takata, Takahiro Kozawa, Yusa Muroya, Stefan De Gendt, Danilo De Simone

Chemistry of Materials 36(3) 1459-1471 2024年2月1日査読有り

Relationship between poly(4-hydroxystyrene) (PHS) and tetramethylammonium hydroxide (TMAH) concentrations during the development of PHS films in TMAH aqueous solution studied by a quartz crystal microbalance (QCM) method

Yuko Tsutsui Ito, Kyoko Watanabe, Yuqing Jin, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics 63(1) 018002-018002 2024年1月10日査読有り責任著者

Shielding effect of underlayer against secondary electrons generated in substrate in extreme ultraviolet lithography

Takahiro Kozawa

Japanese Journal of Applied Physics 63(1) 016503-016503 2023年12月27日査読有り筆頭著者最終著者責任著者

Automatic evaluation of line-and-space resist patterns with defects using image recognition technology

Yuqing Jin, Takahiro Kozawa, Kota Aoki, Tomoya Nakamura, Yasushi Makihara, Yasushi Yagi

International Conference on Extreme Ultraviolet Lithography 2023 2023年11月21日

Sensitization of polymethacrylate resist with adding acid-generating promoters upon exposure to EUV light

Kazumasa Okamoto, Akihiro Konda, Yuki Ishimaru, Takahiro Kozawa, Yasunobu Nakagawa, Masamichi Nishimura

Japanese Journal of Applied Physics 62(11) 116503-116503 2023年11月1日責任著者

Effects of underlayer absorption coefficient on bridging risk in chemically amplified resist process for extreme ultraviolet lithography

Takahiro Kozawa

Japanese Journal of Applied Physics 62(11) 116502-116502 2023年11月1日筆頭著者責任著者

Analysis of resist images with pattern defects by Hough transform

Yuqing Jin, Takahiro KOZAWA, Kota Aoki, Tomoya Nakamura, Yasushi Makihara, Yasushi Yagi

Japanese Journal of Applied Physics 086502 2023年7月24日査読有り責任著者

Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and γ-radiolysis

Yui Takata, Yusa Muroya, Takahiro Kozawa, Kohei Machida, Satoshi Enomoto, Bilal Naqvi, Danilo De Simone

Japanese Journal of Applied Physics 62(7) 076502-076502 2023年7月1日査読有り責任著者

Defect risks at interfaces of chemically amplified resists in extreme ultraviolet lithography process

Takahiro Kozawa

Japanese Journal of Applied Physics 62(7) 076501-076501 2023年7月1日査読有り責任著者

Classification of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Hitomi Betsumiya, Yuqing Jin, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics 62(6) 066501-066501 2023年6月8日査読有り責任著者

Design of High-Sensitive EUV Resist Materials based on Polyacetals

Hiroyuki Maekawa, Yutaro Iwashige, Hiroyuki Yamamoto, Kazumasa Okamoto, Takahiro Kozawa, Hiroto Kudo

Journal of Photopolymer Science and Technology 36 31-39 2023年6月査読有り

Photoresist stochastic defect generation depending on alkyl chain length and concentration of tetraalkylammonium hydroxide in alkali aqueous developer

Masahiko Harumoto, Andreia Figueiredo dos Santos, Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa

Japanese Journal of Applied Physics 62 SG1037 2023年3月23日査読有り責任著者

Effects of photoacid generator decomposition on dissolution kinetics of poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Yutaro Iwashige, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics 62(3) 036502-036502 2023年3月10日査読有り責任著者

Stochastic defect generation depending on tetraalkylhydroxide aqueous developers in extreme ultraviolet lithography

Masahiko Harumoto, Andreia Figueiredo dos Santos, Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa

Japanese Journal of Applied Physics 62(1) 016503-016503 2023年1月6日査読有り責任著者

Protected unit distribution near interfaces of chemically amplified resists used for extreme ultraviolet lithography

Takahiro Kozawa

Japanese Journal of Applied Physics 62(1) 016509-016509 2023年1月査読有り筆頭著者

Interfacial effects on sensitization of chemically amplified extreme ultraviolet resists

Takahiro Kozawa

Japanese Journal of Applied Physics 61(11) 116501-116501 2022年10月18日査読有り責任著者

Theoretical study on defect risks of chemically amplified resists used for extreme ultraviolet lithography

Takahiro Kozawa

Japanese Journal of Applied Physics 61(10) 106502-106502 2022年9月21日査読有り

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