2018年6月1日
High-Throughput Screening of Sulfide Thermoelectric Materials Using Electron Transport Calculations with OpenMX and BoltzTraP
Journal of Electronic Materials
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- 巻
- 47
- 号
- 6
- 開始ページ
- 3254
- 終了ページ
- 3259
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1007/s11664-017-6020-9
- 出版者・発行元
- Springer New York LLC
The electron transport properties of 809 sulfides have been investigated using density functional theory (DFT) calculations in the relaxation time approximation, and a material design rule established for high-performance sulfide thermoelectric (TE) materials. Benchmark electron transport calculations were performed for Cu12Sb4S13 and Cu26V2Ge6S32, revealing that the ratio of the scattering probability of electrons and phonons (κlatτel −1) was constant at about 2 × 1014 W K−1 m−1 s−1. The calculated thermopower S dependence of the theoretical dimensionless figure of merit ZTDFT of the 809 sulfides showed a maximum at 140 μV K−1 to 170 μV K−1. Under the assumption of constant κlatτel −1 of 2 × 1014 W K−1 m−1 s−1 and constant group velocity v of electrons, a slope of the density of states of 8.6 states eV−2 to 10 states eV−2 is suitable for high-ZT sulfide TE materials. The Lorenz number L dependence of ZTDFT for the 809 sulfides showed a maximum at L of approximately 2.45 × 10−8 V2 K−2. This result demonstrates that the potential of high-ZT sulfide materials is highest when the electron thermal conductivity κel of the symmetric band is equal to that of the asymmetric band.
- リンク情報
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- DOI
- https://doi.org/10.1007/s11664-017-6020-9
- Web of Science
- https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000431920400028&DestApp=WOS_CPL
- Scopus
- https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85038612767&origin=inward
- Scopus Citedby
- https://www.scopus.com/inward/citedby.uri?partnerID=HzOxMe3b&scp=85038612767&origin=inward
- ID情報
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- DOI : 10.1007/s11664-017-6020-9
- ISSN : 0361-5235
- SCOPUS ID : 85038612767
- Web of Science ID : WOS:000431920400028