三宅雅人 (Masato Miyake) - マイポータル

基本情報

所属: 奈良先端科学技術大学院大学研究推進機構准教授 (国際共同研究担当ディレクター)

ORCID iD: https://orcid.org/0000-0002-5280-1251
J-GLOBAL ID: 202201018880042952
researchmap会員ID: R000033204

論文

PH sensor based on chemical-vapor-deposition-synthesized graphene transistor array

Nursakinah Mohd Zaifuddin, Shogo Okamoto, Takashi Ikuta, Yasuhide Ohno, Kenzo Maehashi, Masato Miyake, Paul Greenwood, Kenneth B.K. Teo, Kazuhiko Matsumoto

Japanese Journal of Applied Physics 52(6 PART 2) 2013年6月
Growth evolution of rapid grown aligned carbon nanotube forests without water vapor on Fe/Al<inf>2</inf>O<inf>3</inf>/SiO<inf>2</inf>/Si substrate

Yasuhiko Hayashi, Toru Iijima, M. Miyake, M. Satoh, N. L. Rupesinghe, K. B.K. Teo, M. Tanmemura

Diamond and Related Materials 20(7) 859-862 2011年7月
Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing

M. Miyake, J. F. Scott, X. J. Lou, F. D. Morrison, T. Nonaka, S. Motoyama, T. Tatsuta, O. Tsuji

Journal of Applied Physics 104(6) 2008年
Layered functional ceramics via misted chemical solution deposition

J. F. Scott, F. D. Morrison, M. Miyake, T. Tatsuta, O. Tsuji

Key Engineering Materials 333 71-76 2007年
Ferroelectric thin-film devices: Failure mechanisms and new prototype nano-structures

J. F. Scott, F. D. Morrison, Y. K. Hoo, A. D. Milliken, H. J. Fan, S. Kawasaki, M. Miyake, T. Tatsuta, O. Tsuji

IEEE International Symposium on Applications of Ferroelectrics 5-8 2007年
Misted deposition of [3D] trenches for drams and frams III. PZT thin films and PZT nanotubes

M. Miyake, J. F. Scott, X. J. Lou, F. D. Morrison, S. Motoyama, T. Tatsuta, O. Tsuji

IEEE International Symposium on Applications of Ferroelectrics 38-40 2007年
Nano-ferroelectric materials and devices

J. F. Scott, F. D. Morrison, M. Miyake, P. Zubko

Ferroelectrics 336 237-245 2006年7月1日
High temperature phase transitions in barium sodium niobate: The wall roughening 1q-2q incommensurate transition and mean field tricritical behaviour in a disordered exclusion model

J. F. Scott, S. A. Hayward, M. Miyake

Journal of Physics Condensed Matter 17(37) 5911-5926 2005年9月21日
Improvement in step coverage of Pb(Zr,Ti)O<inf>3</inf> thin films deposited by liquid delivery metalorganic chemical vapor deposition

Yohei Otani, Norikazu Abe, Masato Miyake, Soichiro Okamura, Tadashi Shiosaki

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 44(7 A) 5133-5136 2005年7月8日
Recent materials characterizations of [2D] and [3D] thin film ferroelectric structures

J. F. Scott, F. D. Morrison, M. Miyake, P. Zubko, Xiaojie Lou, V. M. Kugler, S. Rios, Ming Zhang, T. Tatsuta, O. Tsuji …

Journal of the American Ceramic Society 88(7) 1691-1701 2005年7月
High-temperature amorphous hafnia (HfO<inf>2</inf>) for microelectronics

M. Miyake, X. J. Lou, Ming Zhang, F. D. Morrison, T. J. Leedham, T. Tatsuta, O. Tsuji, J. F. Scott

Integrated Ferroelectrics 74 165-172 2005年
Fabrication of PZT thin films by liquid delivery MOCVD with conventional multi-sources and a novel cocktail source

Tadashi Shiosaki, Soichiro Okamura, Masato Miyake, Yohei Otani, Norikazu Abe

Ferroelectrics 293 69-88 2003年6月1日
Influence of a TiO<inf>2</inf> adhesion layer on the structure and the orientation of a Pt layer in Pt/TiO<inf>2</inf>/SiO<inf>2</inf>/Si structures

Norikazu Abe, Yohei Otani, Masato Miyake, Masaaki Kurita, Hiroaki Takeda, Soichiro Okamura, Tadashi Shiosaki

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 42(5 A) 2791-2795 2003年5月
Fabrication of Pb(Zr,Ti)O<inf>3</inf> thin films by liquid delivery MOCVD using a cocktail source with Pb(METHD)<inf>2</inf>, Zr(METHD)<inf>4</inf> and Ti(MPD)(METHD)<inf>2</inf>

Yohei Otani, Norikazu Abe, Yoshiki Ueda, Masato Miyake, Soichiro Okamura, Tadashi Shiosaki

Integrated Ferroelectrics 51 63-72 2003年
Fabrication of ferroelectric Pb(Zr, Ti)O<inf>3</inf> thin films by liquid delivery metalorganic chemical vapor deposition

Masato Miyake, Kyungho Lee, Susumu Kawasaki, Yoshiki Ueda, Soichiro Okamura, Tadashi Shiosaki

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 41(1) 241-244 2002年
Influence of reactor pressure on the formation of PZT thin films by liquid delivery MOCVD

Yoshiki Ueda, Norikazu Abe, Yohei Otani, Masato Miyake, Soichiro Okamura, Tadashi Shiosaki

Integrated Ferroelectrics 46 125-131 2002年