論文

査読有り
2017年6月

Purification of commercial yttrium metal: Removal of fluorine

JOURNAL OF CRYSTAL GROWTH
  • A. Takenouchi
  • ,
  • T. Otomo
  • ,
  • K. Niwa
  • ,
  • M. Sakai
  • ,
  • Y. Saito
  • ,
  • T. Kirigane
  • ,
  • M. Kosaka
  • ,
  • S. Michimura
  • ,
  • S. Hasegawa
  • ,
  • O. Nakamura

468
15
開始ページ
701
終了ページ
704
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/j.jcrysgro.2016.11.091
出版者・発行元
ELSEVIER SCIENCE BV

We have performed refining process of yttrium (Y) by removal of fluorine (F) residually existing in commercial Y metal. It was demonstrated that combination of conventional plasma arc melting and mechanical surface polishing is a powerful method for removal of F, the residual concentration of which was traced by energy dispersive X-ray spectroscopy of as processed material and X-ray photoemission spectroscopy of as deposited films, which were grown using the processed material as a deposition source. As a result, the concentration of F in our purified material was assessed to be smaller than 3.5 wt ppm, which is approximately 1.3% of the initial F concentration present in the unpurified material (260 wt ppm).

リンク情報
DOI
https://doi.org/10.1016/j.jcrysgro.2016.11.091
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000404750000146&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.jcrysgro.2016.11.091
  • ISSN : 0022-0248
  • eISSN : 1873-5002
  • Web of Science ID : WOS:000404750000146

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